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Method for manufacturing nanoscale grating based on polydimethylsiloxane (PDMS)

A manufacturing method and nano-scale technology, which are applied in diffraction grating, patterned surface photoengraving process, optics, etc., can solve the problems of harsh and complex process conditions, high manufacturing cost, difficult control, etc., and achieve simple process, low cost, Easy-to-operate effects

Inactive Publication Date: 2013-01-16
ZHONGBEI UNIV
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Problems solved by technology

[0006] In order to solve the problems of expensive equipment, harsh and complex process conditions, difficult control, high production cost and long cycle in the existing nanoscale grating manufacturing method, the present invention provides a low-cost, short cycle, simple process, and easy-to-control based Fabrication method of nanoscale grating in PDMS

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  • Method for manufacturing nanoscale grating based on polydimethylsiloxane (PDMS)
  • Method for manufacturing nanoscale grating based on polydimethylsiloxane (PDMS)
  • Method for manufacturing nanoscale grating based on polydimethylsiloxane (PDMS)

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Embodiment Construction

[0026] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0027] A method for fabricating a nanoscale grating based on PDMS, comprising the steps of:

[0028] a. Make grating master template 5 by photolithography technology;

[0029] b. Transfer the grating pattern of the grating master template 5 in step a to the PDMS film 6 to make a PDMS film 7 with the grating pattern;

[0030] c. Clamp the PDMS film 7 with the grating pattern on the electronically controlled translation stage, after setting the stretching ratio parameter, biaxially stretch the PDMS film 7 with the grating pattern along the length direction of the grid line 8, and the grid line 8 The width of the grid line 8 is elongated and narrowed, that is, the period of the grating pattern becomes smaller, and then the stretched PDMS film 9 is fixed on a flat substrate 4;

[0031] d, transfer the grating pattern whose period becomes smaller...

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Abstract

The invention relates to the technical field of grating manufacturing and particularly relates to a method for manufacturing a nanoscale grating based on PDMS. The method solves the problems that existing nano grating manufacturing methods are expensive in used devices, severe and complex in process condition, difficult to control, high in manufacturing cost and long in period. The method for manufacturing the nanoscale grating based on the PDMS comprises the steps of a, manufacturing a grating masterplate (5) through a photoetching technology; b, transferring a grating pattern of the grating masterplate (5) in Step a onto a PDMS film (6) to manufacturing a PDMS film (7) with the grating pattern; and c, clamping the PDMS film (7) with the grating pattern on an electrically-controlled translation platform. The nanoscale grating which is obtained through the method is formed on the PDMS film firstly, the PDMS is a good intermediate mould material, and reverse moulding is conducted on the PDMS film again, so that nanoscale gratings of various other materials can be manufactured.

Description

technical field [0001] The invention relates to the technical field of grating fabrication, in particular to a PDMS-based nanoscale grating fabrication method. Background technique [0002] As a very important spectroscopic element, gratings are widely used in the fields of integrated optical circuit, optical communication, optical interconnection, optical information processing, optical measurement and so on. At present, the applications of gratings are mostly concentrated on the nanoscale, so the fabrication of nanoscale gratings has become very important, and there are various methods for fabricating nanoscale gratings. [0003] Laser holographic lithography is a maskless lithography technology based on the interference effect of coherent light. In this technology, multiple laser beams are used to generate interference effects on the wafer surface to generate interference patterns composed of bright and dark areas. The graphics are arranged in a repeating period, and the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G03F7/00
Inventor 王万军段俊萍张斌珍杨潞霞崔敏姚德启张勇范新磊
Owner ZHONGBEI UNIV
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