Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Substrate, method for exposure of substrate to light, and photo-alignment treatment method

An exposure method and substrate technology, which can be used in optics, optomechanical equipment, nonlinear optics, etc., and can solve problems such as uneven display, light leakage, and reduced display quality.

Inactive Publication Date: 2012-10-10
SHARP KK
View PDF5 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, display unevenness, light leakage, etc. may occur in the manufactured display panel (a display panel to which the above-mentioned other display area is applied), and the display quality may deteriorate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate, method for exposure of substrate to light, and photo-alignment treatment method
  • Substrate, method for exposure of substrate to light, and photo-alignment treatment method
  • Substrate, method for exposure of substrate to light, and photo-alignment treatment method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0057] Embodiments of the present invention will be described in detail below with reference to the drawings.

[0058] The substrate 1 according to the embodiment of the present invention is a substrate used to manufacture a substrate for a liquid crystal display panel (or a substrate used to manufacture a liquid crystal display panel). The exposure method according to the embodiment of the present invention is an exposure method for irradiating light energy to the alignment film in a step of aligning the alignment film by a photo-alignment method (=a step of irradiating light energy to the alignment film to align). An alignment film is formed on the substrate 1 according to the embodiment of the present invention, and then an alignment treatment is performed on the formed alignment film by the exposure method according to the embodiment of the present invention. That is, the substrate 1 according to the embodiment of the present invention is a substrate having a configuration...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Disclosed are: a substrate in which all of regions to be exposed to light can be irradiated with a light energy with high accuracy; and a light exposure method. Using a light exposure device (5) that is equipped with multiple light exposure units (52) each comprising a light source (521) and a mask (522) having, formed therein, a light-transmissive pattern (5221) that can transmit a light energy emitted from the light source (521), a substrate (1) is irradiated with the light energy through the light-transmissive pattern (5221) formed in the mask (522) while moving the substrate (1) and the light exposure units (52) relatively to each other. At the same time, in one of the light exposure units (52) in which the mask (522) straddles a display region (11a) having a predetermined size and a display region (11b) having a different size from the predetermined size, both the display region (11a) having the predetermined size and the display region (11b) having the different size are irradiated with the light energy using an alignment pattern (12) formed on the substrate (1) as a benchmark for the control of alignment of mask (522).

Description

technical field [0001] The present invention relates to a substrate, an exposure method for the substrate, and a photo-alignment treatment method. Specifically, it relates to a substrate for a liquid crystal display panel or a substrate suitable for photo-alignment treatment among substrates used for manufacturing a liquid crystal display panel, and for the substrate. An exposure method and a photo-alignment treatment method using the exposure method. Background technique [0002] A general liquid crystal display panel includes two substrates for a display panel, and has a configuration in which the two substrates are arranged facing each other with a predetermined minute interval therebetween, and liquid crystal is filled between them. Generally, an alignment film for regulating the alignment of liquid crystals is formed on a substrate for a liquid crystal display panel. The alignment film is formed during the manufacturing process of the substrate for the display panel an...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02F1/1337G02F1/13G03F9/00G09F9/00G09F9/30
CPCG03F7/7035G02F1/133788G03F7/2057
Inventor 平子贵浩
Owner SHARP KK
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products