Substrate, method for exposure of substrate to light, and photo-alignment treatment method
An exposure method and substrate technology, which can be used in optics, optomechanical equipment, nonlinear optics, etc., and can solve problems such as uneven display, light leakage, and reduced display quality.
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[0057] Embodiments of the present invention will be described in detail below with reference to the drawings.
[0058] The substrate 1 according to the embodiment of the present invention is a substrate used to manufacture a substrate for a liquid crystal display panel (or a substrate used to manufacture a liquid crystal display panel). The exposure method according to the embodiment of the present invention is an exposure method for irradiating light energy to the alignment film in a step of aligning the alignment film by a photo-alignment method (=a step of irradiating light energy to the alignment film to align). An alignment film is formed on the substrate 1 according to the embodiment of the present invention, and then an alignment treatment is performed on the formed alignment film by the exposure method according to the embodiment of the present invention. That is, the substrate 1 according to the embodiment of the present invention is a substrate having a configuration...
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