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High ultraviolet transmitting double-layer wire grid polarizer for fabricating photo-alignment layer and fabrication method thereof

A technology of wire grid polarization and light-controlled orientation, which is applied in polarizing elements, optics, optical elements, etc., can solve the problems of lowering the total transmittance, and achieve the effects of improving the production efficiency, increasing the degree of polarization, and increasing the transmittance

Inactive Publication Date: 2012-07-11
LG CHEM LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, UV light is absorbed into this polarizer, resulting in a decrease in the overall transmittance

Method used

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  • High ultraviolet transmitting double-layer wire grid polarizer for fabricating photo-alignment layer and fabrication method thereof
  • High ultraviolet transmitting double-layer wire grid polarizer for fabricating photo-alignment layer and fabrication method thereof
  • High ultraviolet transmitting double-layer wire grid polarizer for fabricating photo-alignment layer and fabrication method thereof

Examples

Experimental program
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Effect test

preparation example Construction

[0040]According to another aspect of the present invention, the preparation method of the ultraviolet high transmittance double-layer wire grid polarizing plate used for the photo-control alignment film comprises: forming an anti-reflection layer on the substrate (step 1); Coating photoresist on top to form a photoresist layer (step 2); selectively exposing the photoresist layer according to the pattern formed by laser interference light and developing the exposed photoresist layer to form a wire grid patterning (step 3); and depositing metal on said wire grid pattern (step 4).

[0041] Step 1 is coating an anti-reflection layer on the substrate. The substrate is an essential part of the polarizing plate, and may be made of any material as long as light can pass through the substrate. Examples of the substrate may include quartz substrates, UV-transparent glass, and plastic substrates.

[0042] The anti-reflection layer refers to the layer covered on the substrate before coa...

Embodiment 1

[0051] Example 1: Preparation of double-layer wire grid polarizer with high UV transmittance

[0052] 1. Formation of anti-reflection layer and photoresist layer

[0053] In this example, a quartz substrate with a size of 10 cm x 10 cm was used, and DUV 42p (Brewer Science) was used as the antireflection layer. Ultra i-123 (Rohm and Hass company) was used as photoresist.

[0054] A 60 nm thick antireflection layer (DUV 42p) is covered on the quartz substrate. After covering the anti-reflection layer, a 60 nm thick Ultra i-123 was coated to form a photoresist layer.

[0055] 2. Forming a wire grid pattern by laser interference exposure

[0056] To form a wire grid pattern on the substrate prepared in Section 1 above, an interference exposure system was used. Such as figure 2 As shown, the interference exposure system uses a beam splitter to split the 266nm laser beam into two beams, and uses an objective lens to amplify these beams, and exposes the above photoresist lay...

experiment example 1

[0060] Experimental example 1: Measurement of transmittance

[0061] The transmittance was measured by using the double-layer wire grid polarizer with high ultraviolet transmittance prepared in Example 1. When randomly polarized light is incident, such as figure 1 The transmittance of the conventional single-layer polarizing plate shown in the comparative example in is 40% at a wavelength of 310 nm. The transmittance of the polarizer described in the embodiment of the present invention is 60%, which is 1.5 times of the transparency of the conventional polarizer.

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Abstract

The present invention relates to a high ultraviolet transmitting double wire grid polarizer for fabricating a photo-alignment layer and a fabrication method thereof for improving the fabrication efficiency of the photo-alignment layer. More specifically, the invention provides a high ultraviolet transmitting double wire grid polarizer comprising: a substrate; a reflection preventing layer which is formed on the substrate; a patterned photosensitive material layer which is formed on the reflection preventing layer; and double metal thin film layers which are respectively formed on the photosensitive material layer and the reflection preventing layer. Further, the invention provides a fabrication method of a high ultraviolet transmitting double wire grid polarizer, the method comprises the steps of: forming a reflection preventing layer on a substrate; forming a photo sensitive material layer by applying photoresist to the top of the reflection preventing layer; forming a wire grid pattern by developing the photosensitive material layer after selectively exposing the photosensitive material layer according to a pattern that is formed by the laser interference light; and depositing metal on the wire grid pattern. Thus, the invention smoothly forms a wire grid by using the reflection preventing layer when the double wire grid polarizer is fabricated, and cuts down the production cost with no need to perform a dry etching process since the metal is deposited after the wire grid of the photosensitive material layer is formed. Further, compared with the existing single wire grid polarizer, the invention improves transmittance and polarization of the ultraviolet region, thereby enhancing the efficiency of the fabrication process of the photo-alignment layer.

Description

technical field [0001] The invention relates to an ultraviolet (UV) high-transmittance double-layer wire grid polarizing plate used for a light-controlled alignment film and a preparation method thereof. Background technique [0002] In a twisted nematic (TN) mode employing a thin film transistor-liquid crystal display (TFT-LCD) along-plane alignment, liquid crystals need to be properly aligned in a specific direction. This alignment of liquid crystals is achieved through a surface-treated alignment film. Since the performance of TFT-LCD greatly depends on the alignment state of liquid crystals, it is very important to develop an excellent alignment film in the manufacture of FTF-LCD. [0003] During the coating of liquid crystal material between glass substrates, simply coating the liquid crystal is not enough to give the liquid crystal an orientation. Therefore, it is necessary to form an alignment film on the inner wall of the substrate in contact with the liquid crysta...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/30G02B1/10
CPCG02B5/3058C09K2323/02Y10T428/2457
Inventor 金在镇金信英辛富建金台洙
Owner LG CHEM LTD
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