Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device and method for generating nested plasma photonic crystals with multiple nesting structures

A technology of plasma and photonic crystals, which is applied in the field of plasma application technology and optics, can solve problems such as the limitation of the application range of plasma photonic crystals, and achieve the effect of wide application fields and wide application prospects

Inactive Publication Date: 2013-04-17
HEBEI UNIVERSITY
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The application range of existing plasmonic photonic crystals is still limited, and it is necessary to research and produce plasmonic photonic crystals with a wider range of applications

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device and method for generating nested plasma photonic crystals with multiple nesting structures
  • Device and method for generating nested plasma photonic crystals with multiple nesting structures
  • Device and method for generating nested plasma photonic crystals with multiple nesting structures

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] (a) A vacuum reaction chamber 1 is set and two opposite water electrodes 2 are installed in the tank, and a glass hexagonal discharge boundary 3 with a thickness of 2.4mm is set between the two water electrodes;

[0025] (b) offer gas inlet 6 on the wall body of described vacuum reaction chamber 1, and fill the mixed gas of argon and air into the vacuum reaction chamber;

[0026] (c) installing a hollow spiral tube heating coil in the vacuum reaction chamber 1, and heating the temperature of the water electrode to 353K;

[0027] (d Discharge conditions: voltage frequency 53kHz, voltage amplitude 4.3kV, air gap pressure 0.5Pa, argon content in the mixed gas in the air gap is 90%, discharge produces plasma photonic crystals with three quadrilateral structures nested. figure 2 one Figure 5 A schematic diagram of a plasmonic photonic crystal with three nested quadrilateral structures produced in this example. Figure 4 Middle: A is the structure diagram of the plasma ph...

Embodiment 2

[0029] First three steps are identical with embodiment 1, (d) step discharge condition is: applied voltage U=4.3kV, frequency f=53kHz, air pressure p=0.5Pa, argon content χ (Ar) = 90%. The pattern photo of the resulting plasmonic photonic crystal with three nested quadrilateral structures is shown in Figure 6 shown.

Embodiment 3

[0031] First three steps are identical with embodiment 1, (d) step discharge condition is: applied voltage U=5.2kV, frequency f=53kHz, air pressure p=0.5Pa, argon content χ (Ar) = 75%. The pattern photo of the resulting plasmonic photonic crystal with three nested quadrilateral structures is shown in Figure 7 shown.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a device and method for generating nested plasma photonic crystals with multiple structures. The device comprises a vacuum reaction chamber and two water electrodes arranged in the vacuum reaction chamber, wherein a glass hexagon electric discharge boundary with a 2.4-mm thickness is arranged between the two water electrodes, an air inlet is arranged on a wall body of the vacuum reaction chamber, and a hollow spiral tube heating coil is arranged in the vacuum reaction chamber. The method for generating the nested plasma photonic crystals comprises the following steps that: the two water electrodes can be heated to be 348K-358K; and the nested plasma photonic crystals with multiple structures can be generated by controlling the discharge conditions, i.e. the voltageamplitude is controlled to be 4.3kV-5.2kV, the frequency is controlled to be 53kHz, the air pressure p is controlled to be equal to 0.5Pa, and the argon content in mixed gas is controlled to be 75%-90%. The plasma photonic crystals disclosed by the invention have the advantages of preventing lights with different frequencies from spreading, playing roles of optical modulators and having wide application prospects in industrial fields.

Description

technical field [0001] The invention relates to the field of plasma application technology and the field of optics, in particular to a device and method for producing plasma photonic crystals with various nested structures. Background technique [0002] Plasma photonic crystals are a new type of photonic crystals in which plasma and other media are periodically arranged. Compared with traditional photonic crystals, the biggest feature of plasmonic photonic crystals is that their structures can be adjusted in time and space, so that their corresponding photonic band gaps can be adjusted. By adjusting the lattice constant, dielectric constant, lattice symmetry, and time period of the plasmonic photonic crystal, people can change its energy band position and width, so that the light whose frequency falls into the band gap is prohibited from propagating, and realizes the control of light. Frequency selection and control of light propagation. Based on the above characteristics,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B6/13G02B1/00H05H1/24
Inventor 董丽芳耿轶青王永杰
Owner HEBEI UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products