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Alkali-developable photosensitive resin composition, and partition suitable for display element and display element formed by employing same

A technology of photosensitive resin and alkali developability, which is applied in the direction of optical components, electrical components, nonlinear optics, etc. It can solve the problems of no mention of compatibility, no touch of anti-ink properties, reduced ink-resistance, etc., and achieve surface appearance And the effect of good pattern shape, excellent surface ink repellency, and excellent compatibility

Active Publication Date: 2011-10-05
NIPPON STEEL CHEMICALL &MATERIAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is a problem that even if silicon-containing oligomers such as surfactants and fluorine-based oligomers move on the surface after firing, their ink repellency decreases with subsequent washing and time.
However, in this patent document 6, its ink repellent property is not touched, and there is no mention of compatibility

Method used

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  • Alkali-developable photosensitive resin composition, and partition suitable for display element and display element formed by employing same
  • Alkali-developable photosensitive resin composition, and partition suitable for display element and display element formed by employing same
  • Alkali-developable photosensitive resin composition, and partition suitable for display element and display element formed by employing same

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Embodiment 1～14 and comparative example 1～2

[0129] First, components (B) to (F) other than the fluororesin (A) component and YX-4000H (manufactured by Showa Shiel; tetramethyldiphenyl epoxy resin) were listed in Table 2 and Table 3. Proportions (parts by weight) were mixed, and propylene glycol monomethyl ether acetate was added to make the solid content concentration 20% by mass. Continue to add (A) component solution with the mass parts described in Table 2 and Table 3. Next, use a 2μm polypropylene membrane filter at 0.2kg / cm 2 Filtration was performed under pressure to prepare an alkali-developing photosensitive resin composition. In Table 2 and Table 3, the compounding ratio with respect to the total solid content is shown by mass % in () of (B) component. In addition, the compounding ratio of (E) component is shown in another column as (pigment / total solid content) mass % with respect to the total solid content. In addition, the meanings of the abbreviations in Table 2 and Table 3 are as follows.

[0130] (B)-...

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Abstract

The invention provides an alkali-developable photosensitive resin composition which can prevent from being compatible with printing ink, and produce films of which the surface has excellent appearance and pattern and excellent ink resistance even after long time use or frequent watching. The alkali-developable photosensitive resin composition contains a fluorine-containing resin (A) serving as an ink-resistant agent and an alkali-developable photosensitive component reacting under ultraviolet light having a wavelength within 300-450 nm, wherein the fluorine-containing resin (A) is a prescribed random or block copolymer, of which the average molecular weight Mw is within the range of 2000-20000. Moreover, the fluorine-containing resin (A) accounts for 0.05-1 mass part relative to total 100 mass parts except the solvent.

Description

technical field [0001] The present invention relates to an alkali-developing photosensitive resin composition, a partition (partition wall) formed using the same, and a display element. Specifically, it relates to an alkali-developing photosensitive resin composition suitable for forming a partition of a display element in an inkjet printing method And the partition formed using it, and a display element. Background technique [0002] Color filters usually form a black matrix (matrix) on the surface of a transparent substrate such as glass or plastic sheet, and then sequentially form three or more different colors such as red, green, and blue in a stripe-like or mosaic-like color pattern. tone. The pattern size varies depending on the application of the color filter and each color, but is about 5 to 700 μm. In addition, the overlapping positional accuracy is several μm to several tens of μm, and it is produced by microfabrication technology with high dimensional accuracy. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/027G02B5/20G02F1/1335H01L51/52
CPCG02B5/20G02B5/201G03F7/00G03F7/004G03F7/0045G03F7/0046
Inventor 吉冈敬裕藤城光一柳本彻也
Owner NIPPON STEEL CHEMICALL &MATERIAL CO LTD
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