Photoetching encrypted anti-counterfeiting method

Abstract

The invention relates to the technical field of photoetching anti-counterfeiting, in particular to a photoetching encrypted anti-counterfeiting method, and provides the photoetching encrypted anti-counterfeiting method for miniaturizing characters and patterns on pixel points. The method comprises the following steps of: taking a glass sheet of which the surface is subjected to uniform gluing as a substrate, and designing a character aperture, namely designing a single character aperture design sheet of miniaturized characters by using a computer; preparing a film; turning the film, namely exposing, developing and slitting the film so as to obtain a single character aperture sheet; designing an original drawing according to the resolution and character space; introducing the original drawing into a photoetching machine computer on a photoetching machine, substituting original common metal apertures, such as a nickel hole with only aperture function for the single character aperture sheet, and exposing a photoresist dot matrix; developing by using developing solution; and electroforming, namely injecting silver and reprinting to obtain a mother set. By adopting the method for increasing characters and patterns in photoetching pixel points, the characters and patterns can be observed by a high power magnifier only, while human visual inspection is substantially consistent with common photoetching. Therefore, the anti-counterfeiting capability of holographic identifiers is improved, and the plate-making technical effect is enriched.

Description

technical field [0001] The invention relates to the technical field of photolithographic anti-counterfeiting, in particular to a photolithographic encryption anti-counterfeiting method. Background technique [0002] At present, the domestic holographic anti-counterfeiting technology adopts a variety of technical means, such as: dynamic holographic technology, multi-channel technology, 2D / 3D technology, dot matrix holographic technology, photochemical relief technology, and micro-encryption technology are used on the molded holographic carrier. , with the rapid popularization of holographic technology, the strength of anti-counterfeiting technology is gradually decreasing, and the difficulty of anti-counterfeiting is gradually increasing. Craftsmanship. [0003] With the development of the holographic anti-counterfeiting industry, products produced by anti-counterfeiting technologies with certain single functions have become very popular. For example, photolithography techno...

AI Technical Summary

Problems solved by technology

In lithography technology, the traditional lithography technology only adds content to the lithography point, most of which are simple geometric shapes, such as square, circle, etc. From the current holographic laser lithography anti-counterfeiting technology From the point of view, anti-counterfeiting technology with only simple geometric shapes on lithography points is difficult to meet the needs of social development, and its anti-counterfeiting effect is greatly reduced. Such lithography technology has relatively large defects in the anti-counterfeiting effect of anti-counterfeiting products. Therefore people begin to study microlithography technology, and in patent literature, existing open literature is to research " the method that adopts microlithography technology to make miniature Chinese characters ", and its patent number is 200510011686.5, and another open literature is " microtext array Anti-counterfeit mark and its production method", its patent number is 200510086954.x, in these two documents, there is no detailed description of the method that can be implemented by ordinary engineers and technicians in the field, and it is only generally described as: using low-light In the engraving technology, the photolithography mask plate-making equipment and technology are used to make microscopic Chinese characters, so that ordinary engineers and technicians understand that the production of microscopic Chinese characters is completed only by the photolithography mask plate-making equipment, which is not so simple in actual production. There are still various methods of using photolithography equipment to make microscopic Chinese characters.

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