Method for making nuclear microporous anti-fake identification
A technology of anti-counterfeiting marks and production methods, which is applied in the field of nuclear microporous anti-counterfeiting marks, and can solve the problems of limited thickness of plastic films, etc.
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Embodiment 1
[0038] Example 1: Irradiate a 20-micron plastic film with heavy ions generated by an accelerator, soak it in a 90°C DMF solution for 2 minutes to sensitize it, then put it in 60°C water for 10 minutes, and then print on one side of the film with an adhesive, and use it on the other side After the pre-coating film is protected, it is etched in 6.5N NaOH solution at 90°C for 2 minutes, and the anti-counterfeiting mark can be made after cleaning and drying.
Embodiment 2
[0039] Example 2: Use reactor neutrons to irradiate fission fragments produced by fission sources to irradiate 12-micron plastic films, soak in 90°C DMF solution for 1 minute to sensitize, then use adhesive to print on one side of the film, and protect the other side with a pre-coated film. Etching in 6.25N NaOH solution at 90°C for 1.58 minutes, the nanometer anti-counterfeiting track film is made.
Embodiment 3
[0040] Example 3: Use heavy ions generated by an accelerator to irradiate a 5-micron plastic film, soak it in a DMF solution at 40°C for 20 minutes to sensitize it, then put it in water at 70°C for 5 minutes, print on one side of the film with an adhesive, and pre-coat it on the other side After the film is protected, it is etched in 6.5N NaOH solution at 90°C for 2 minutes, and the anti-counterfeiting mark can be made after cleaning and drying.
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