Artificial compound eye lens with controllable curvature and preparation method thereof
The technology of eye lens and fly eye lens is applied in the field of artificial compound eye lens and its preparation, which can solve the problems of high cost, increase the preparation cost, low efficiency, etc., and achieve the effect of increasing the field of view and improving the quality of edge imaging.
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Embodiment 1
[0030] Such as Figure 1a As shown, this embodiment includes: a compound eye base and a circular structure fly eye lens, wherein: the compound eye base has a spherical crown base with a diameter of 1 cm and a height of 4 mm, and the fly eye lens is a spherical convex lens with a diameter of 160 microns and a height of 16 microns.
[0031] The present embodiment is prepared through the following steps:
[0032] The first step is to clean the silicon wafer substrate, sputter chromium on the silicon wafer substrate, and make a metal layer with a thickness of 100 angstroms;
[0033] Such as Figure 1b As shown, the second step is to spin-coat photoresist on the surface of the metal layer, and then use a circular compound eye array structure to form a columnar convex structure through photolithography;
[0034] The circular compound eye array has a cylindrical diameter of 150 microns and a height of 18 microns.
[0035] The third step is to place the photoresist-coated silicon wa...
Embodiment 2
[0050] Such as Figure 2a-Figure 2d As shown, this embodiment includes: a compound eye base and a fly eye lens with a hexagonal structure, wherein: the diameter of the compound eye base is a curved base with a step feature of 1.8 cm, and the fly eye lens is a hexagon with a diagonal length of 190 microns and a height of 19 microns shaped convex lens.
[0051] The present embodiment is prepared through the following steps:
[0052] The first step is to clean the silicon wafer substrate, sputter chromium on the silicon wafer substrate, and make a metal layer with a thickness of 100 angstroms;
[0053] The second step is to spin-coat photoresist on the surface of the metal layer, and then use a mask plate with a hexagonal column array structure to form a columnar convex structure through photolithography;
[0054] The hexagonal pillars have a diameter of 180 microns and a height of 21 microns.
[0055] The third step is to place the photoresist-coated silicon wafer substrate i...
Embodiment 3
[0070] Such as Figure 3a-Figure 3d As shown, this embodiment includes: a compound eye base and a fly eye lens with a square structure, wherein: the diameter of the compound eye base is a hollow spherical base with a height of 2 cm and a height of 8 mm, the hollow diameter of which is 1 cm and a height of 3 mm, and the fly eye lens has a side length of 180 Micron, a square convex lens with a height of 20 microns.
[0071] The present embodiment is prepared through the following steps:
[0072] The first step is to clean the silicon wafer substrate, sputter chromium on the silicon wafer substrate, and make a metal layer with a thickness of 100 angstroms;
[0073] The second step is to spin-coat photoresist on the surface of the metal layer, and then use a mask plate with a square compound eye array structure to form a columnar convex structure through photolithography;
[0074] The square columns of the square compound eye array have a diameter of 175 microns and a height of ...
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