Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Plasma generation equipment rendered electrically neutral on the periphery of plasma gun

A plasma and generation device technology, applied in the direction of plasma, ion implantation plating, circuit, etc., can solve the problem of loss of thin film uniformity, and achieve the effect of reducing and suppressing the transmission efficiency

Active Publication Date: 2010-01-27
日本磁性技术株式会社
View PDF1 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, generation of droplets is a problem in surface treatment such as film formation
If the droplet adheres to the surface of the object to be processed, the uniformity of the film formed on the surface of the object to be processed will be lost, and it will become a defective product of the film

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Plasma generation equipment rendered electrically neutral on the periphery of plasma gun
  • Plasma generation equipment rendered electrically neutral on the periphery of plasma gun
  • Plasma generation equipment rendered electrically neutral on the periphery of plasma gun

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0180] Hereinafter, embodiments of the plasma generation device according to the present invention will be described in detail with reference to the drawings. In the present invention, both an apparatus provided with a plasma processing unit (unit to be treated with plasma) for processing an object to be processed and an apparatus without a plasma processing unit are included as plasma generating apparatuses. A plasma generation device having a plasma processing unit may also be referred to as a plasma processing device.

[0181] figure 1 It is a schematic configuration diagram of the plasma generation device according to the present invention. figure 1 The plasma generating apparatus shown is composed of a plasma generating unit (plasma tube) for generating plasma by vacuum arc discharge in a vacuum atmosphere, a plasma processing unit 401 , and a plasma traveling path 402 . In the description of the present invention, the plasma advancing path 402 means the path from the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Plasma generation equipment having a plasma gun which can remove droplets mixed with plasma efficiently without reducing the effective amount of plasma generated by vacuum arc discharge and in which a droplet removing section can be constituted easily and inexpensively, and precision of surface treatment of films by high purity plasma can be enhanced. Periphery of the cathode (407) of a plasma gun is surrounded by an enclosure member (420) and a droplet remover (406) constituted by laying a plurality of droplet catching members (411) in multilayer is provided on the inside of the enclosure member (420). The enclosure member (420), the catching member (411) and a plasma traveling path (402) have no relation of connection with an arc power supply (409) and held in electrically neutral floating state.

Description

technical field [0001] The present invention relates to the generation of plasma by vacuum arc discharge in an arc discharge part set in a vacuum atmosphere, and is provided with cathode material particles (hereinafter referred to as droplets (droplets). ) The plasma generation device of the droplet removal part removed. Background technique [0002] Generally, in plasma, a technique of improving the surface properties of a solid by forming a thin film on the surface of a solid material and implanting ions is known. Films formed by plasma containing metal ions and non-metal ions are used to enhance the wear resistance and corrosion resistance of solid surfaces, and are used as protective films, optical films, transparent conductive films, etc. In particular, a carbon film using carbon plasma is highly useful as a diamond-like material film (called a DLC film) composed of an amorphous mixed crystal of a diamond structure and a graphite structure. [0003] As a method of gen...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32H05H1/32
CPCH01J2237/022H01J2237/05H05H1/48H01J37/32633H01J37/147H01J37/3178H01J37/32055H01J2237/3142
Inventor 椎名祐一
Owner 日本磁性技术株式会社
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com