Tungsten nitride based ternary nano composite super-hard film material and preparation method thereof
A tungsten nitride-based ternary and nano-composite technology, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of low hardness of hard coating, limited bonding force, coating layer and substrate problems such as poor bonding
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Embodiment 1
[0024] The specific steps of preparation are: step 1, placing the composite target and substrate composed of metal tungsten and metal substitutes on the cathode and the sample stage in the vacuum chamber of the magnetron sputtering equipment respectively; wherein, the metal tungsten in the composite target is replaced by metal The area ratio between the objects is 2:1, the distance between the composite target and the substrate is 50mm, the metal replacement is metal tantalum, and the substrate is stainless steel. Before placing the substrate in the sample stage in the vacuum chamber of the magnetron sputtering equipment, first It is polished, washed and spin-dried. Step 2, the vacuum degree of the vacuum chamber is 1×10 -3 pa, after the substrate temperature reaches 350°C, put the vacuum chamber in an argon-nitrogen mixed atmosphere, and sputter for 120 minutes; among them, before putting the vacuum chamber in an argon-nitrogen mixed atmosphere, first pass argon into the vacu...
Embodiment 2
[0026] The specific steps of preparation are: step 1, placing the composite target and substrate composed of metal tungsten and metal substitutes on the cathode and the sample stage in the vacuum chamber of the magnetron sputtering equipment respectively; wherein, the metal tungsten in the composite target is replaced by metal The area ratio between the objects is 4:1, the distance between the composite target and the substrate is 53 mm, the metal replacement is metal tantalum, and the substrate is stainless steel. Before placing the substrate in the sample stage in the vacuum chamber of the magnetron sputtering equipment, first It is polished, washed and spin-dried. Step 2, the vacuum degree of the vacuum chamber is 8×10 -4 pa, after the substrate temperature reaches 380°C, place the vacuum chamber in an argon-nitrogen mixed atmosphere, and sputter for 105 minutes; among them, before putting the vacuum chamber in an argon-nitrogen mixed atmosphere, first pass argon into the v...
Embodiment 3
[0028] The specific steps of preparation are: step 1, placing the composite target and substrate composed of metal tungsten and metal substitutes on the cathode and the sample stage in the vacuum chamber of the magnetron sputtering equipment respectively; wherein, the metal tungsten in the composite target is replaced by metal The area ratio between the objects is 6:1, the distance between the composite target and the substrate is 55mm, the metal replacement object is metal tantalum, and the substrate is stainless steel. Before placing the substrate in the sample stage in the vacuum chamber of the magnetron sputtering equipment, the It is polished, washed and spin-dried. Step 2, the vacuum degree of the vacuum chamber is 5×10 -4 pa, after the substrate temperature reaches 400°C, put the vacuum chamber in an argon-nitrogen mixed atmosphere, and sputter for 90 minutes; among them, before putting the vacuum chamber in an argon-nitrogen mixed atmosphere, first pass argon into the ...
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