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Tungsten nitride based ternary nano composite super-hard film material and preparation method thereof

A tungsten nitride-based ternary and nano-composite technology, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of low hardness of hard coating, limited bonding force, coating layer and substrate problems such as poor bonding

Inactive Publication Date: 2010-01-13
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, both the hard coating and its manufacturing method have shortcomings. First, the hardness of the hard coating is not high, and its hardness has not reached the requirement of greater than 20GPa; secondly, the bonding force between the coating layer and the substrate Poor; again, the method of vapor deposition limits the hardness of the film layer and the bonding force between the film layer and the substrate. Although the bonding force between the film layer and the substrate can be improved by increasing the underlying coating, it also increases the manufacturing cost of the coating layer. complexity and cost

Method used

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  • Tungsten nitride based ternary nano composite super-hard film material and preparation method thereof
  • Tungsten nitride based ternary nano composite super-hard film material and preparation method thereof
  • Tungsten nitride based ternary nano composite super-hard film material and preparation method thereof

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Embodiment 1

[0024] The specific steps of preparation are: step 1, placing the composite target and substrate composed of metal tungsten and metal substitutes on the cathode and the sample stage in the vacuum chamber of the magnetron sputtering equipment respectively; wherein, the metal tungsten in the composite target is replaced by metal The area ratio between the objects is 2:1, the distance between the composite target and the substrate is 50mm, the metal replacement is metal tantalum, and the substrate is stainless steel. Before placing the substrate in the sample stage in the vacuum chamber of the magnetron sputtering equipment, first It is polished, washed and spin-dried. Step 2, the vacuum degree of the vacuum chamber is 1×10 -3 pa, after the substrate temperature reaches 350°C, put the vacuum chamber in an argon-nitrogen mixed atmosphere, and sputter for 120 minutes; among them, before putting the vacuum chamber in an argon-nitrogen mixed atmosphere, first pass argon into the vacu...

Embodiment 2

[0026] The specific steps of preparation are: step 1, placing the composite target and substrate composed of metal tungsten and metal substitutes on the cathode and the sample stage in the vacuum chamber of the magnetron sputtering equipment respectively; wherein, the metal tungsten in the composite target is replaced by metal The area ratio between the objects is 4:1, the distance between the composite target and the substrate is 53 mm, the metal replacement is metal tantalum, and the substrate is stainless steel. Before placing the substrate in the sample stage in the vacuum chamber of the magnetron sputtering equipment, first It is polished, washed and spin-dried. Step 2, the vacuum degree of the vacuum chamber is 8×10 -4 pa, after the substrate temperature reaches 380°C, place the vacuum chamber in an argon-nitrogen mixed atmosphere, and sputter for 105 minutes; among them, before putting the vacuum chamber in an argon-nitrogen mixed atmosphere, first pass argon into the v...

Embodiment 3

[0028] The specific steps of preparation are: step 1, placing the composite target and substrate composed of metal tungsten and metal substitutes on the cathode and the sample stage in the vacuum chamber of the magnetron sputtering equipment respectively; wherein, the metal tungsten in the composite target is replaced by metal The area ratio between the objects is 6:1, the distance between the composite target and the substrate is 55mm, the metal replacement object is metal tantalum, and the substrate is stainless steel. Before placing the substrate in the sample stage in the vacuum chamber of the magnetron sputtering equipment, the It is polished, washed and spin-dried. Step 2, the vacuum degree of the vacuum chamber is 5×10 -4 pa, after the substrate temperature reaches 400°C, put the vacuum chamber in an argon-nitrogen mixed atmosphere, and sputter for 90 minutes; among them, before putting the vacuum chamber in an argon-nitrogen mixed atmosphere, first pass argon into the ...

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Abstract

The invention discloses a tungsten nitride based ternary nano composite super-hard film material and a preparation method thereof. The material is a nano composite super-hard film which is covered on a substrate and has a chemical formula of WxM1-xN, wherein in the nano composite super-hard film, W represents tungsten metal, M represents metal replacement, N represents nitrogen, and the value range of the x is 0.06 to 0.72; and the film consists of the tungsten metal, nitride solid solution phase of the M metal and tungsten metal phase or consists of tungsten nitride phase, tungsten metal phase and M metal phase, the grain size of the film is 4 to 30 nanometers, and the thickness of the film is 3 to 7mu m. The method comprises the following steps: firstly, placing a composite target consisting of the tungsten metal and the metal replacement and the substrate on a cathode and in a sample stage in a vacuum chamber of magnetron sputtering equipment respectively; after the vacuum degree of the vacuum chamber is less than or equal to 1*10<-3> pa and the temperature of the substrate reaches 350 and 450 DEG C, making the vacuum chamber in argon-nitrogen mixed atmosphere, sputtering the composite target for 60 to 120 minutes to obtain the tungsten nitride based ternary nano composite super-hard film material. The film material and the preparation method can be widely applied in the fields of mechanical manufacture, automobile and textile industry, geologic drilling, die industry and the like.

Description

technical field [0001] The invention relates to a composite superhard thin film material and a preparation method thereof, in particular to a tungsten nitride-based ternary nanocomposite superhard thin film material and a preparation method thereof. Background technique [0002] With the development of society, human beings have higher and higher requirements for materials. In addition to continuing to develop new materials to meet the needs, how to improve the utilization rate of materials is also the focus of attention. In some application fields, materials are required to have both flexibility and strength, as well as certain hardness and wear resistance, such as cutting tools in machining, drill bits for deep energy exploration, molds used in machinery manufacturing, and engines. Cylinder etc. For this reason, based on the limitations of existing material properties, people try to use surface modification technology and surface coating process to maintain the high stren...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B41/85C23C14/35C23C14/54C23C14/06
Inventor 杨俊峰刘庆袁志刚王伟国程帜军王先平方前锋
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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