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Apparatus and method for producing transparent conductive oxide film

An oxide thin film, transparent and conductive technology, applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problems of increasing equipment cost and increasing equipment complexity, and reduce equipment cost, energy and density Controllable, responsive effects

Inactive Publication Date: 2009-08-19
王凯 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The application of all these technologies not only increases the complexity of the equipment, but also increases the cost of the equipment.

Method used

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  • Apparatus and method for producing transparent conductive oxide film
  • Apparatus and method for producing transparent conductive oxide film
  • Apparatus and method for producing transparent conductive oxide film

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Embodiment Construction

[0032] The present invention will be further described and elaborated below in conjunction with the accompanying drawings. figure 2 Shown is a schematic structural diagram of a preferred embodiment of the preparation equipment of the transparent conductive oxide film provided by the present invention, including: a closed reaction chamber or a vacuum chamber 1, the reaction chamber 1 is made of austenitic stainless steel or non-magnetic material, and is horizontal Type arrangement, also can be vertical. It is equipped with a vacuum system 9 and an intake system 10; the vacuum system 9 is composed of a mechanical pump 11 and a molecular pump or a cryopump 12, which can vacuumize the reaction chamber to 10 -6 -10 -7 Torr (vacuum degree). A movable substrate frame 7 is arranged at the middle position of the upper part of the reaction chamber, and the substrate frame 7 is disc-shaped, square, or barrel-shaped. A heater 8 is provided on the back of the substrate frame 7, and a b...

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Abstract

The invention relates to a transparent conducting oxide thin film, in particular to preparation equipment of the transparent conducting oxide thin film and a method thereof. The preparation equipment comprises a closed reaction chamber with a vacuum-pumping system and an air inlet system; wherein, a base plate frame capable of moving or rotating is arranged inside the closed reaction chamber, furnished with a heater, a baffle and a sputtering source arranged opposite to the base plate frame. The difference lies in that an oxygen ion source is arranged between the substrate frame and the sputtering source. The centric angles of the oxygen ion source and the base plate frame are adjustable within the range from 0 degree to 180 degrees. In the invention, reactive plasma oxygen is used as a reactant replacing the oxygen, thus greatly reducing the probability of anode disappearing and cathode poisoning and the frequency of arc starting and enhancing the operating stability of the system. In addition, the structure is simple, the manufacturing cost and the operation and maintenance cost is low.

Description

technical field [0001] The invention relates to a transparent conductive oxide film, in particular to a preparation device and method for the transparent conductive oxide film. Background technique [0002] Transparent conductive oxide (TCO) thin films have the unique properties of transparency in the visible range and good electrical conductivity. Therefore, they are widely used as transparent electrodes in the field of optoelectronic devices, such as flat panel displays and solar cells. There are many techniques for preparing transparent conductive oxide thin films, including evaporation, sputtering, and pulsed laser deposition. Among them, sputtering technology is the leading technology adopted on a large scale in the industry. [0003] Sputtering technology usually uses a substrate or substrate as an anode and a metal or compound target as a cathode, and a glow discharge occurs between them in a few millitorr or lower pressure sputtering gas, such as argon, to generate ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/08C23C14/35C23C14/38C23C14/40
Inventor 王凯姚栋
Owner 王凯
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