Pixel structure, display panel and method for manufacturing optoelectronic device

Abstract

The invention provides methods for manufacturing a pixel structure, a display panel and a photoelectrical device. The method for manufacturing the pixel structure comprises the steps as follows: firstly, a baseplate is provided and is provided with a transistor area, a capacitor area and a pixel area; subsequently, a film transistor and a capacitor electrode are formed on the baseplate, wherein, the capacitor electrode is covered by a dielectric layer; then, a color filter layer is formed on the film transistor and the capacitor electrode, and a protection layer is formed on the color filter layer; patterned photoresist layers with different thicknesses are formed on the protection layer, and partial protection layer and partial patterned photoresist layers are removed sequentially to expose partial source / drain electrode of the film transistor and partial protection layer; then, the protection layer is covered by a conductive layer in a conformal way, and partial patterned photoresist layer is removed to define a pixel electrode. The invention can reduce the manufacturing cost, shorten technical time and increase the productivity, and the capacitance value of the capacitance stored in the pixel structure is improved effectively.

Description

technical field [0001] The present invention relates to a manufacturing method of a pixel structure, a display panel and an optoelectronic device, and in particular to a manufacturing method of a pixel structure capable of reducing the number of photomasks, and a manufacturing method of a display panel and an optoelectronic device having the pixel structure. Background technique [0002] Liquid crystal displays have the advantages of high image quality, small size, light weight, low voltage drive, low power consumption, and wide application range. Therefore, they have replaced cathode ray tubes (Cathode Ray Tube, CRT) and become the mainstream of the new generation of displays. At present, the market is oriented toward high contrast ratio, no gray scale inversion, high brightness, high color saturation, fast response ( response) and wide viewing angle (viewing angle) and other directions. Currently common wide viewing angle technologies include: twisted nematic liquid cryst...

AI Technical Summary

Problems solved by technology

[0004] In the known technology, at least seven photomask processes are required to manufacture the color filter layer on the thin film transistor array, and the color filter pattern needs to be manufactured through three photomask processes, so the steps are complicated higher production costs

In addition, the above-mentioned pixel structure requiring at least seven photomask processes needs to use multiple photomasks with different patterns. Since the cost of photomasks is very expensive, the manufacturing cost of the pixel structure will not be reduced. And due to the large number of photomasks, the production capacity cannot be effectively improved

Images