Method for producing silane gas
A production method and gas technology, applied in the direction of silicon hydride, etc., can solve the problems of low product purity, the method cannot meet the industrial production, and the yield is low.
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specific Embodiment approach 1
[0007] Specific Embodiment 1: The production method of silane gas in this embodiment is realized according to the following steps: 1. Weigh 1 part of silicon powder, 1 to 1.5 parts of magnesium powder and 1.5 to 2 parts of ammonium chloride according to the ratio of parts by weight; 2. Mix the weighed silicon powder and magnesium powder, and then put the temperature at 400-600°C and a vacuum of 500-600Pa to react for 2-4 hours to obtain magnesium silicide; 3. Mix the weighed ammonium chloride Mix with magnesium silicide in a reactor with liquid ammonia as the medium, react at -50 to -100°C for 4 to 6 hours, and the resulting reactant is absorbed by 3A molecular sieves and purified by deep cooling to obtain silane gas; among them, step 3 Medium and deep cooling and purification adopt liquid nitrogen cooling distillation device.
specific Embodiment approach 2
[0008] Embodiment 2: The difference between this embodiment and Embodiment 1 is that in step 1, 1 part of silicon powder, 1.2 parts of magnesium powder and 1.8 parts of ammonium chloride are weighed in parts by weight. Other steps and parameters are the same as those in Embodiment 1.
specific Embodiment approach 3
[0009] Specific embodiment 3: The difference between this embodiment and specific embodiment 1 is that in step 2, the temperature is 500° C. and the vacuum degree is 550 Pa to react for 3 hours. Other steps and parameters are the same as those in Embodiment 1.
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