Automated low-volume tangential flow filtration process development device
A tangential flow filtration and process technology, applied in filtration and separation, measuring devices, membrane filters, etc., can solve problems such as waste
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[0097] An automated TFF process development facility electronically configured with the previously described electronic data processing network is structurally configured as outlined in FIG. 7 and the table below:
[0098] parameters
value
Diaphragm area
50cm 2
Minimum recirculation volume
<20ml / PXL 50
2
starting volume
200ml to 1 liter
6 bar (86psi)
Feed flow rate
Up to 100ml / min
Processing temperature
4 to 55°C
pH
1 to 14
Can
1000ml recovery
device holder
PXL standard
Pump:
[0099] -feed(range)
0 to 100ml / min at 80psi
-filter(range)
0 to 50ml / min at 10psi
-coflow(range)
0 to 100ml / min at 80psi
-transfer(range)
0 to 100ml / min at 10psi
valve
Open close
- retain back pressure
-8 port selector
pressure indicator
-f...
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