Positioning device having two object holders
a technology of object holders and positioning devices, which is applied in the direction of cameras, maintainance and safety accessories, and large fixed members, etc., can solve the problems that the characterization of the semiconductor substrate present on the second object holders and the exposure of the semiconductor substrate present on the first object holders cannot be carried out independently from each other, and the exposure of the semiconductor substrate present on the first object holders cannot be started, so as to achieve the effect of high degree of adjustability of the object tables
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[0018]The lithographic device according to the invention shown diagrammatically in FIG. 1 is used for the exposure of semiconductor substrates in the manufacturing process of integrated semiconductor circuits and comprises a frame 1 which supports in that order, as seen parallel to a vertical Z-direction, a positioning device 3 according to the invention, a focusing unit 5, a mask holder 7, and a radiation source 9. The lithographic device is an optical lithographic device whose radiation source 9 comprises a light source 11. The mask holder 7 comprises a support surface 13 which extends perpendicularly to the Z-direction and on which a mask 15 can be placed comprising a pattern or a sub-pattern of an integrated semiconductor circuit. The focusing unit 5 is an imaging or projection system and comprises an optical lens system 17 having a main optical axis 19 extending parallel to the Z-direction and an optical reduction factor of, for example, 4 or 5. The positioning device 3 compris...
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