Process for deposition of crack-free and corrosion-resistant hard chromium and chromium alloy layers
a hard chromium alloy and crack-free technology, applied in the field of crack-free and corrosion-resistant hard chromium and chromium alloy layers and an electrolytic chromium plating composition, can solve problems such as cracks in layers, and achieve the effect of high current efficiency
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Electrolytic Chromium Plating Compositions
[0029] Ten electrolytic chromium plating compositions were prepared including the additives of the present invention. Each composition was used to plate an alloy layer over an inductively hardened CK45 steel substrate. The base electrolytic composition (included in all 10 compositions) contained chromium(VI) oxide (CrO3) in a concentration of 280 g / L and sulfuric acid (H2SO4) in a concentration of 2.8 g / L. The steel substrates were plated at current of either 10A or 14A for 30 minutes, and the performance of the electrolytic plating compositions were measured in terms of current efficiency and deposition rate. The results are shown in the following table.
3-hydroxypropane-1-sulfonicHalogen oxoanionSulfonicCurrent DensityCurrentDeposition RateNo.acid (mL / L)concentration (g / L)acid (g / L)Current (A)(A / dm2)Efficiency (%)(μm / min)1800105037.31.39621020105037.071.3883103.40147036.76n.d.4123.40147038.79n.d.5820105040.231.5066820147037.332.010710201...
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