Gas processing apparatus and method and computer storage medium storing program for controlling same

Abstract

A processing apparatus includes a processing vessel, a gas introduction unit, a processing gas supply unit, a nonreactive gas supply unit, a vacuum pumping unit, a pressure gauge and a control unit. The control unit controls a valve opening ratio of a pressure control valve based on a detection value of the pressure gauge while making a processing gas flow to a flow rate controller of the processing gas supply unit at a constant flow rate when performing a process in which a partial pressure of the processing gas is important. Meanwhile, when performing a process wherein the partial pressure of the processing gas is relatively unimportant, the control unit fixes the valve opening ratio of the pressure control valve at a predetermined value, and operating a flow rate controller of the nonreactive gas supply unit to control a flow rate based on the detection value.

Description

[0001] This application is a Continuation-In-Part of PCT International Application No. PCT / JP03 / 014266 filed on Nov. 10, 2003, which designated the United States. FIELD OF THE INVENTION [0002] The present invention relates to a processing apparatus and method for performing specific processes on, e.g., a semiconductor wafer and the like, and a computer readable storage medium storing therein a program for controlling same. BACKGROUND OF THE INVENTION [0003] Generally, for fabricating a semiconductor integrated circuit, various processes, such as a film forming process, an etching process, a thermal oxidation process, a diffusion process, a reforming process, a crystallization process and the like, are performed repeatedly on an object to be processed such as a semiconductor wafer to form a desired integrated circuit. Further, in order to remove unnecessary films or particles deposited to a processing vessel and the like, a cleaning process for removing the above-mentioned unnecessar...

AI Technical Summary

Benefits of technology

[0018] It is, therefore, a primary object of the present invention to provide a processing apparatus and method and a computer readable storage medium storing therein a program for controlling same, wherein a pressure control can be properly performed in each processing without using a bypass line or multiple pressure control valves, even in case when many kinds of processes of big differences in processing pressure ranges are carried out.

[0019] Further, it is another object of the present invention to provide a processing apparatus and method and a computer readable storage medium storing therein a program for controlling same, wherein a pressure control can be properly performed in each processing without using multiple pressure control valves.

[0021] As described above, in case when performing a process wherein a processing pressure is low and the partial pressure of the processing gas is important, the valve opening ratio of the pressure control valve is adjusted to control an inner pressure of the processing vessel while making the processing gas at a constant flow rate, or in case when performing a process wherein the processing pressure is high and the partial pressure of the processing gas is relatively unimportant, the flow rate of the nonreactive gas is adjusted to control the inner pressure of the processing vessel while fixing the valve opening ratio of the pressure control valve at a predetermined value. Therefore, a pressure control can be properly performed in each process without using a bypass line or multiple pressure control valves, even in case when many kinds of processes of big differences in a processing pressure ranges are carried out.

[0026] As described above, the bypass exhaust path is installed in the vacuum pumping unit, and at the same time, the soft start valve mechanism is installed in the bypass exhaust path. Moreover, the valve opening ratio of the pressure control valve is adjusted to control the inner pressure of the processing vessel during the relatively low processing pressure process; and the exhaust toward the pressure control valve is stopped, and at the same time, the exhaust gas flows to the bypass exhaust path to set the inner pressure of the processing vessel while the soft start valve mechanism is maintained at a low pumping conductance state during the relatively high processing pressure process. Therefore, it is unnecessary to install expensive and large scaled multiple pressure control valves, and it is possible to make small a structure of the pumping unit and to simplify it.

Problems solved by technology

H10-11152 (Pages 2 to 4 and FIGS. 1 to 5)], the ballast gas whose flow rate is controlled is to be introduced to the pumping system, so that it cannot properly cope with a case where there is a big change in the processing pressure.

Further, a large amount of unnecessary nonreactive gas is employed, resulting in an operation cost increase for the apparatus.

Moreover, in the conventional apparatus shown in FIG. 8, the bypass exhaust line 42 in which the second pressure control valve 44 is installed needs to be installed, resulting in a further cost increase of the apparatus itself.

In addition, since many components are employed and it takes much time for maintenance thereof, the maintenance becomes problematic.

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