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Polishing sheet and manufacturing method of elastic plastic foam sheet

a manufacturing method and plastic foam technology, applied in the direction of manufacturing tools, synthetic resin layered products, edge grinding machines, etc., can solve the problems of low polishing efficiency, disadvantage in the life span of the polishing sheet, and defects at the surface of aluminum base plate, etc., to achieve the effect of improving waviness

Inactive Publication Date: 2005-05-26
FUJIBO HLDG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the polishing sheet of this type has flexibility, there are drawbacks in that a polishing efficiency is low and a roll-off, i.e., peripheral edge portions of a material to be polished are polished more than a central portion thereof, occurs easily.
However, because the polishing sheet of this type has a high hardness, for example, when the sheet is used in polishing work for an aluminum base plate for a hard disc, there is a drawback in that defects may occur at a surface of the aluminum base plate.
However, since a diameter of the opened relatively large cells changes due to abrasion at the surface of the polishing sheet and polishing performance (waviness of the surface, polishing rate) is gradually lowered, it has a disadvantage in a life span of the polishing sheet.

Method used

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  • Polishing sheet and manufacturing method of elastic plastic foam sheet
  • Polishing sheet and manufacturing method of elastic plastic foam sheet
  • Polishing sheet and manufacturing method of elastic plastic foam sheet

Examples

Experimental program
Comparison scheme
Effect test

first embodiment

(First Embodiment)

[0028] A first embodiment where a polishing sheet according to the present invention is applied to a polishing pad polishing for an aluminum base plate used for a hard disc will be explained with reference to the drawings.

[0029]

[0030] As shown in FIG. 1, a polishing pad 1 has a polyurethane sheet 2 which is formed by a polyurethane resin and which serves as an elastic plastic foam sheet. A surface layer (skin layer, See numeral 9 in FIG. 6.), at which small foams are formed, is removed from the polishing pad 1. Thus, in this embodiment, the polyurethane sheet 2 constitutes a polishing layer, and the polishing layer once positioned inside the surface layer is exposed at a surface of the polyurethane sheet 2. In the polyurethane sheet 2, foams 3 which are approximately uniformly dispersed in the polyurethane resin. A space volume of the foams 3 is larger than that of the foams formed at the surface layer. These foams 3 are communicated so as to form a network by uni...

second embodiment

(Second Embodiment)

[0049] Next, a second embodiment where a polishing sheet according to the present invention is applied to a polishing pad polishing for an aluminum base plate used for a hard disc will be explained. In a manufacturing method of the polishing pad according to this embodiment, re-solidification of the polyurethane resin is delayed by a high density DMF in a coagulation liquid, in stead of adding the control organic solvent to the polyurethane resin solution explained in the first embodiment. Incidentally, in this embodiment, the same apparatus and members as those in the first embodiment are denoted by the same reference numerals and an explanation thereof is omitted, and only different portions will be explained. Further, in this embodiment, examples where the DMF densities in the coagulation liquid are 20 weight % and 40 weigh % are shown just for simplification in explanation, however, the DMF density is allowed to take in a range of from 20 weight % to 50 weight...

example 1

(EXAMPLE 1)

[0061] As shown in the following Table 1, in Example 1, polyester MDI (diphenylmethane diisocyanate) polyurethane resin was uses as the polyurethane resin according to the first embodiment. The resin emulsion 45 was prepared by adding and blending ethyl acetate of 45 parts as the control organic solvent, a DMF dispersing liquid of 40 weight parts including carbon black of 30% as the pigment, and a hydrophobic activator of 2 weight parts as the film-forming stabilizer, to 30% polyurethane resin solution of 100 weight parts. The coagulation liquid 25 was heated to 40 degrees Celsius. The polishing pad 1 was manufactured by, after coating the resin emulsion 45 onto the flexible film to form the film the polyurethane sheet 2, pasting the film made of the PET as the supporting member 7 to the polyurethane sheet 2 which was peeled off from the flexible film. Incidentally, in Table 1, X expresses the number of adding parts of the ethyl acetate to the polyurethane resin solution ...

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Abstract

A polishing sheet which can improve waviness at a face of a material to be polished and which has a long life is provided. The polishing pad 1 has a polyurethane sheet 2 made of polyurethane resin. The polyurethane sheet 2 has a polishing layer which is disposed inside a surface layer and which is allowed to wear away by polishing and whose thickness is larger than a thickness of the surface layer. The polishing layer has an approximately uniform foam structure in a direction of the thickness of the polishing sheet 2 by being formed foams whose space volume is larger than that of foams formed at the surface layer and which are communicated so as to form a network by continuous holes whose diameter is smaller than that of the space volume of the foams formed at the polishing layer.

Description

BACKGROUND OF THE INVENTION [0001] 1. Field of the Invention [0002] The present invention relates to a polishing sheet and a manufacturing method of an elastic plastic foam sheet for the polishing sheet, and in particular relates to a polishing sheet having an elastic plastic foam sheet which is of use to precision polishing work and a manufacturing method of an elastic plastic foam sheet for the polishing sheet. [0003] 2. Description of Related Art [0004] Conventionally, a polishing sheet is used to perform flattening work on a material required for flatness at a high accuracy, such as an optical material such as a lens, a plane parallel plate, a reflecting mirror or the like, a base plate for a hard disc, a silicon wafer, a liquid crystal glass or the like. For example, as a polishing sheet used for accurate flattening work, e.g. for the silicon wafer or the like, a polishing sheet of a nonwoven type obtained by coagulating a nonwoven fabric after the nonwoven sheet is impregnated...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): B24B37/20B24B37/24B24D3/32B24D11/00B32B5/22B32B27/40C08J5/14C08L75/04H01L21/304
CPCB24D3/32B24D11/001B32B27/40B32B5/18B32B25/14B32B5/02Y10T428/249987Y10T428/249953B32B5/245B32B2038/0016B32B5/32B32B38/0004
Inventor KUME, TAKAHIROIWAO, TOMOHIRO
Owner FUJIBO HLDG
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