Liquid crystal display and manufacturing method thereof
a technology of liquid crystal display and manufacturing method, which is applied in the field of liquid crystal display, can solve the problems of crosstalk, the opening ratio of the liquid crystal display cannot be increased, and the parasitic capacity cdp is increased, and achieves the effects of low crosstalk, high quality, and hardly increasing parasitic capacity cdp
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example 2
[0097] Example 2 of the invention is hereinafter described.
[0098] The manufacturing method of the picture element section according to this example 2 is same as that shown in example 1, as far as the manufacturing steps before forming a Cs line 11a are concerned.
[0099] As shown in FIG. 9, the Cs line 11a dose not form a line section parallel to the gate line 2 in the picture element, but is arranged and formed above the source line 7 and an adjacent source line 7 through the source insulating film by overlapping a part of a picture element electrode 14a on the adjacent gate line 2. The Cs line 11a is not formed into a ring being different from example 1, but is arranged along the longitudinal direction (shorter direction than lateral direction) of liquid crystal panel. As a result, the line resistance can be restrained to be small as compared with the arrangement in lateral direction.
[0100] By forming the picture element electrode 14a shown in FIG. 9, the distance between the source...
example 3
[0102] Example 3 of the invention is hereinafter described.
[0103] FIG. 10 is a plane view showing a picture element of the liquid crystal display according to example 3 of the invention. The picture element shown in FIG. 10 is arranged forming a matrix and forms a display section.
[0104] In the drawing, reference numeral 201 indicates a source line, numeral 202 indicates a gate line arranged crossing over the source line 201, and numeral 203 is a Cs line forming a Cs capacity which is arranged along the gate line 202 and formed in the same manufacturing step as that of the gate line 202.
[0105] Numeral 204 is a semiconductor layer forming a channel of TFT, and numeral 205 is a picture element electrode forming a display section and is formed in a region defined by the source line 201 and the gate line 202. Numeral 206 is a drain electrode of TFT which is connected to the picture element electrode 205. The semiconductor 204, the source line 201, the gate line 202 and the drain electrod...
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