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Process for preparing ZrN/Al2 (O1-xNx)3 hard nano multi-layer coating

A nano-multilayer, coating technology, applied in the coating, metal material coating process, ion implantation plating and other directions, can solve the problem of low coating preparation efficiency and achieve the effect of great application value

Inactive Publication Date: 2006-06-28
上海工具厂有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The object of the present invention is to overcome the deficiency that existing nitride / oxide nanometer multi-layer coating preparation efficiency is low, provides a kind of ZrN / Al 2 (O 1-x N x ) 3 The preparation method of hard nanometer multi-layer coating, it adopts in Ar gas and N 2 Preparation of ZrN / Al in the mixed atmosphere of gas 2 (O 1-x N x ) 3 Nano multi-layer coating, with high production efficiency, the prepared coating has both high hardness and excellent oxidation resistance, suitable for high-speed cutting and dry cutting

Method used

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  • Process for preparing ZrN/Al2 (O1-xNx)3 hard nano multi-layer coating
  • Process for preparing ZrN/Al2 (O1-xNx)3 hard nano multi-layer coating

Examples

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example 1

[0021] ZrN / Al of the present invention 2 (O 1-x N x ) 3 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.2Pa, N 2 The gas partial pressure is 0.012Pa, the Zr target sputtering power is 260V×0.2A, the deposition time is 10 seconds, the Al 2 o 3 The target sputtering power is 30W, the deposition time is 1 second, and the substrate temperature is 2 (O 1-x N x ) 3 The thickness of the ZrN layer in the multilayer coating is 2 nm, Al 2 (O 1-x N x ) 3 (x=0.06) The layer thickness is 0.3nm, the hardness of the coating is 30GPa, and the anti-oxidation temperature exceeds 1000°C.

example 2

[0023] ZrN / Al of the present invention 2 (O 1-x N x ) 3 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.2Pa, N 2 The gas partial pressure is 0.012Pa, the Zr target sputtering power is 260V×0.2A, the deposition time is 10 seconds, the Al 2 o 3 The target sputtering power is 50W, the deposition time is 1 second, and the substrate temperature is 2 (O 1-x N x ) 3 The thickness of the ZrN layer in the multilayer coating is 2 nm, Al 2 (O 1-x N x ) 3 (x=0.06) The layer thickness is 0.5nm, the hardness of the coating is 33GPa, and the anti-oxidation temperature exceeds 1000°C.

example 3

[0025] ZrN / Al of the present invention 2 (O 1-x N x ) 3 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.2Pa, N 2 The gas partial pressure is 0.030Pa, the Zr target sputtering power is 260V×0.2A, the deposition time is 10 seconds, the Al 2 o 3 The target sputtering power is 70W, the deposition time is 3 seconds, and the substrate temperature is 2 (O 1-x N x ) 3 The thickness of the ZrN layer in the multilayer coating is 2 nm, Al 2 (O 1-x N x ) 3 (x=0.06) The layer thickness is 1.1nm, the hardness of the coating is 30GPa, and the anti-oxidation temperature exceeds 1000°C.

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Abstract

The invention relates to a ZrN / Al2(O1-xNx)3 solidness nanometer multi-layer coating preparing method. It belongs to ceramic material technique field. It adopts direct current cathode control metallic Zr target and radio frequency cathode control Al2O3 target, gains ZrN and Al2(O1-xNx)3 layer by reaction sputtering under the mixture gas of Ar gas and N2 gas, and gains ZrN / Al2(O1-xNx)3 nanometer multi-layer coating with periodic change component, high rigidity and oxidation resistance by adjusting each target sputtering frequency and basal piece rotating residence time. The rigidity of the formed coating is higher than 30GPa. And its high temperature oxidation resistance is over 1000 centigrade degree. As the nitride / oxide nanometer multi-layer coating manufacturing technique, the invention has high production efficiency, and can be used in coating industrial production.

Description

technical field [0001] The present invention relates to a method in the technical field of ceramic materials, in particular to a ZrN / Al 2 (O 1-x N x ) 3 A preparation method for a hard nanometer multilayer coating. Background technique [0002] High-speed and dry cutting technology put forward higher requirements on the performance of tool coatings. In addition to requiring the coating to have mechanical properties such as high hardness and low friction coefficient that ordinary cutting tool coatings should have, it is also required that the coating has excellent High temperature oxidation resistance. However, although the existing tool coatings have high hardness, their oxidation resistance cannot meet the harsh service conditions of high-speed and dry cutting. For example, the hardness of the most commonly used TiN coating is about 23GPa, and its oxidation resistance temperature is about 500°C; although the hardness of TiCN coating is as high as 40GPa, the oxidation r...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/34C23C14/54
Inventor 许辉胡祖光祝新发李戈扬董云杉刘艳
Owner 上海工具厂有限公司
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