Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Growth factor-containing skull repair polyether-ether-ketone material and preparation method thereof

A growth factor, polyetheretherketone technology, applied in tissue regeneration, pharmaceutical formulations, prostheses, etc., can solve problems such as safety hazards, the process of surface modification of PEEK materials, etc., to achieve easy-to-obtain results

Active Publication Date: 2022-05-31
ASIA BIOMATERIALS WUHAN CO LTD
View PDF8 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of this application is to provide a polyether ether ketone material containing growth factors for skull repair and its preparation method to solve the problem of potential safety hazards in the current surface modification process of PEEK materials

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Growth factor-containing skull repair polyether-ether-ketone material and preparation method thereof
  • Growth factor-containing skull repair polyether-ether-ketone material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0047] According to a typical embodiment of the present invention, a method for preparing a polyetheretherketone material for skull repair containing growth factors is provided, the method comprising:

[0048] S1. Analyze the head to be repaired to obtain the information of the skull defect;

[0049] S2. Molding polyether ether ketone according to the information of the skull defect site to obtain a matrix;

[0050] In some embodiments, the substrate can use polyether ether ketone two-dimensional braided fabric material or polyetheretherketone material produced by 3D printing, and the following only uses 3D printing to prepare the substrate for illustration:

[0051] Firstly, CT plain scan and enhanced scan of the skull defect are performed, and then 3D reconstruction is performed to determine the position, size, shape, etc. of the skull defect; then the scanned data is poured into the software for bone defect model design, saved in STL format and imported into a 3D printer, ...

Embodiment 1

[0097] A preparation method of polyether ether ketone material containing growth factors for skull repair, the steps are as follows:

[0098] A polyether ether ketone material is obtained or prepared. Obtain polyetheretherketone two-dimensional braided material or produce polyetheretherketone material through 3D printing. The method of 3D printing to produce polyetheretherketone material is as follows: firstly, conduct plain and enhanced CT scans of the skull defect, and then perform 3D reconstruction to determine the position, size, shape, etc. of the skull defect; then import the scanned data into the software for bone defect Design the model, save it in STL format and import it into the 3D printer, use software to correct and calibrate the skull defect model, use digital equipment to shape according to the model data, and produce PEEK that matches the defect site. Polyether ether ketone raw materials meet the standard of YY / T 0660-2008 "Standard specification for polyether...

Embodiment 2

[0108] A preparation method of polyether ether ketone material containing growth factors for skull repair, the steps are as follows:

[0109] A polyether ether ketone material is obtained or prepared. Obtain polyetheretherketone two-dimensional braided material or produce polyetheretherketone material through 3D printing. The method of 3D printing to produce polyetheretherketone material is as follows: firstly, conduct plain and enhanced CT scans of the skull defect, and then perform 3D reconstruction to determine the position, size, shape, etc. of the skull defect; then import the scanned data into the software for bone defect Design the model, save it in STL format and import it into the 3D printer, use software to correct and calibrate the skull defect model, use digital equipment to shape according to the model data, and produce PEEK that matches the defect site. Polyether ether ketone raw materials meet the standard of YY / T 0660-2008 "Standard specification for polyether...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Concentrationaaaaaaaaaa
Login to View More

Abstract

The invention particularly relates to a skull repair polyether-ether-ketone material containing growth factors and a preparation method of the skull repair polyether-ether-ketone material, and belongs to the technical field of biomedical materials.The method comprises the steps that polyether-ether-ketone is formed, and a matrix is obtained; the preparation method comprises the following steps: modifying a matrix by using the polydopamine nano-microspheres to obtain a modified matrix; mixing a mineralization auxiliary agent with the guided tissue regeneration layer solution to obtain a mineralized guided tissue regeneration layer solution; mixing the microspheres loaded with the growth factors with a mineralization guided tissue regeneration layer solution to obtain a mineralization guided tissue regeneration layer solution containing the growth factors; mixing a cross-linking agent, a modification matrix and the mineralization guided tissue regeneration layer solution containing the growth factors to obtain a mixture; and reacting the mixture, drying, crosslinking, analyzing and sterilizing to obtain the skull repair polyether-ether-ketone material. Polydopamine nanoparticles are used for cross-linking modification of polyether-ether-ketone, raw materials are easy to obtain, safe and environmentally friendly, and hidden dangers brought to human bodies in the preparation process and the use of a final product are avoided.

Description

technical field [0001] The invention belongs to the technical field of biomedical materials, in particular to a polyether ether ketone material containing growth factors for skull repair and a preparation method thereof. Background technique [0002] Skull defect is a common secondary disease clinically. It is mainly seen in various traumas and postoperatives, such as electric shocks, car accident injuries, gunshot wounds, resection of malignant skull tumors, congenital deformities, and decompressive craniectomy. In principle, skull defects with a maximum diameter of more than 3 cm require skull reconstruction surgery. When the skull defect exceeds 3 cm, clinical symptoms can occur. Successful skull reconstruction needs to meet three requirements: (1) maintain the integrity of the dura mater, that is, the protection of the brain; (2) protect the barrier between the brain and the outside world, that is, biomechanical stability; (3) maintain the normal state of the head The ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61L27/18A61L27/34A61L27/30A61L27/32A61L27/50A61L27/54A61L27/58
CPCA61L27/18A61L27/34A61L27/306A61L27/32A61L27/50A61L27/54A61L27/58A61L2300/414A61L2300/412A61L2430/02A61L2400/18A61L2300/602A61L2300/606A61L2420/02A61L2420/04A61L2420/06C08L61/16C08L79/02C08L89/00C08L67/04C08L29/04
Inventor 唐三王喆周雄
Owner ASIA BIOMATERIALS WUHAN CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products