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Texture preparation method of cover plate, cover plate and electronic equipment

A technology of electronic equipment and cover plate, which is applied in the direction of electrical equipment casing/cabinet/drawer, microlithography exposure equipment, electrical components, etc., and can solve the problem that the texture of the cover plate cannot be refined

Pending Publication Date: 2022-05-13
ONEPLUS TECH SHENZHEN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of this, the present application provides a method for preparing the texture of the cover plate to solve the problem that the texture of the existing cover plate cannot be refined

Method used

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  • Texture preparation method of cover plate, cover plate and electronic equipment
  • Texture preparation method of cover plate, cover plate and electronic equipment
  • Texture preparation method of cover plate, cover plate and electronic equipment

Examples

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preparation example Construction

[0018] see figure 1 , the embodiment of the present application provides a method for preparing a cover plate texture, comprising the following steps: S1, providing a cover plate; S2, spraying a photosensitive coating on the surface of the cover plate as an appearance, and drying the photosensitive coating; S3 1. Adjust the laser line width of the laser engraving equipment to a preset threshold, perform radium engraving exposure on the light-sensitive coating on the cover plate, and generate a texture pattern at the part where the light-sensitive coating is subjected to laser engraving exposure; S4, according to the texture pattern on the cover The plate is etched to form textured lines on the cover plate.

[0019] In this embodiment, the preset threshold of the laser line width preset threshold is 0.01 mm. When preparing the texture on the cover plate, the laser is emitted by adjusting the width of the laser on one laser or using lasers with different laser widths. A laser w...

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Abstract

The invention discloses a texture preparation method of a cover plate. The texture preparation method comprises the steps that the cover plate is provided; a light sensation coating is sprayed on the surface, serving as the appearance, of the cover plate, and the light sensation coating is dried; adjusting the laser line width of a laser device laser etching device to be a preset threshold value, performing laser etching exposure on the light sensation coating on the cover plate, and generating a texture pattern at the laser etching exposure part of the light sensation coating; etching the cover plate according to the texture pattern so as to form texture lines on the cover plate; texture patterns with different line diameters and line widths are exposed on the light sensation coating in a laser etching mode, the texture patterns exposed through laser line width laser etching with the degree smaller than 0.01 mm can be exposed, the texture patterns with the line width or the line distance smaller than 0.01 mm can be exposed, and therefore fine textures with the line width or the line distance smaller than 0.01 mm can be etched on the cover plate according to the texture patterns during etching. Therefore, refinement of the cover plate is facilitated.

Description

technical field [0001] The present application relates to the technical field of glass processing, in particular to a texture preparation method of a cover plate, a cover plate, and electronic equipment. Background technique [0002] Some existing devices often have a cover plate on the surface, and some textures are made on the cover plate. [0003] The existing method of making texture on the cover plate mainly uses the technology of exposure, development and etching. First, the film film attached to the glass is exposed, developed to generate a texture pattern, and then the texture is etched on the cover plate according to the texture pattern. . [0004] However, in the method in the prior art, the fineness and complexity of the texture on the cover completely depends on the fineness and complexity of the exposure and development technology and the film diaphragm used for exposure and development, and the fineness and complexity of the film diaphragm The degree of preci...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05K5/02G03F7/20
CPCH05K5/0243G03F7/20
Inventor 张辉
Owner ONEPLUS TECH SHENZHEN
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