Improved contact algorithm-based material point method applied to double-color coin imprinting forming simulation

A material point and mass point technology, applied in the field of imprinting, can solve problems such as virtual contact

Pending Publication Date: 2022-04-15
JIANGSU UNIV
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Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that point-to-point contact will cause virtual contact in the material point method, and to provide a material point method based on an improved contact algorithm that is applied to the embossing and forming simulation of two-color coins

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  • Improved contact algorithm-based material point method applied to double-color coin imprinting forming simulation
  • Improved contact algorithm-based material point method applied to double-color coin imprinting forming simulation
  • Improved contact algorithm-based material point method applied to double-color coin imprinting forming simulation

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Embodiment Construction

[0082] In order to clarify the purpose, technical solution and advantages of the present invention, the present invention will now be described in more detail in conjunction with the attached structures and examples. The invention is a material point method based on an improved contact algorithm applied to the embossing and forming simulation of two-color coins, comprising the following steps:

[0083] Step 1: Establish a dynamic physical model for the two-color coin imprinting process;

[0084] From a mechanical point of view, the imprint forming process is a quasi-static low-speed motion process. Generally, the implicit integral method is used to solve the problem. However, considering the complex surface patterns of commemorative coins, millions of grids are required to describe them, resulting in a large amount of memory for solving linear equations. At the same time, the imprinting process is accompanied by complex material nonlinearities. Using Newton-Raphson iterativ...

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Abstract

The invention provides a material point method based on an improved contact algorithm, which is applied to double-color coin imprinting forming simulation. The method comprises the following steps of: establishing a dynamic physical model for a double-color coin imprinting forming process; carrying out material point integration on the dynamic model in the imprinting forming process; performing finite element triangle / quadrilateral unit discretization on the forming die; establishing a background grid according to the blank cake data model, performing tetrahedron / hexahedron unit discretization on the bicolor coin blank cake, and establishing a mass point set of a copper and aluminum material area; and calculating strain increment and rotation rate increment of the mass points, solving stress and elastic-plastic related variables of the mass points according to the constitutive model, and updating the density of all the mass points. According to the method, the problem of material self-contact judgment in double-color coin stamping forming finite element simulation is solved through a material point method.

Description

technical field [0001] The invention relates to the field of embossing technology, in particular to a material point method based on an improved contact algorithm applied in the embossing and forming simulation of two-color coins Background technique [0002] The production of two-color metal coins is a very important technology for coin anti-counterfeiting today, which is conducive to improving the anti-counterfeiting performance of residents using metal coins. At the same time, the exquisitely designed two-color coins are highly ornamental and highly collectible. With the continuous innovation of science and technology, higher requirements are put forward for the manufacture of metal coins, especially for the production of this kind of two-color coins with obvious advantages and high technical content. During the actual embossing process of two-color coins, two different materials are in contact with each other and squeezed, which is prone to stress concentration problems...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/20G06F119/14
Inventor 余振源许江平李阳
Owner JIANGSU UNIV
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