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Preparation process of antireflection film for OLED flexible display

An anti-reflection film, flexible display technology, applied in metal material coating process, sputtering coating, semiconductor/solid-state device manufacturing, etc. and heat shielding effect, high toughness strength, good protective effect

Active Publication Date: 2022-04-12
SOUTHWEAT UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the main raw material for the preparation of anti-reflection film for OLED is TAC (triacetate film). TAC anti-reflection film has strong light penetration and stable adhesion to polarized PVA film, but its dimensional stability and surface properties are difficult. affected by the environment

Method used

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  • Preparation process of antireflection film for OLED flexible display
  • Preparation process of antireflection film for OLED flexible display

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] Such as figure 1 Shown: a kind of OLED flexible display anti-reflection film of the present embodiment, its structure comprises:

[0046] The base film 1, its raw material comprises PMMA and COP, and the thickness of the base film 1 is 756 angstroms;

[0047] Magnesium fluoride substrate 2, which is deposited on the surface of the base film 1, the thickness of the magnesium fluoride substrate 2 is 208 angstroms;

[0048] Aluminum oxide film layer 3, which is deposited on the surface of the magnesium fluoride substrate 2, the thickness of the aluminum oxide film layer 3 is 336 angstroms;

[0049] Hafnium oxide film layer 4, which is deposited on the surface of the aluminum oxide film layer 3, the thickness of the hafnium oxide film layer 4 is 540 angstroms;

[0050] Silicon dioxide film layer 5, which is deposited on the surface of the hafnium oxide film layer 4, and the thickness of the silicon dioxide film layer 5 is 545 angstroms;

[0051] The preparation process o...

Embodiment 2

[0066] A kind of anti-reflection film for OLED flexible display of the present embodiment, its structure comprises:

[0067] The base film, its raw materials include PMMA and COP, the thickness of the base film is 756 angstroms;

[0068] Magnesium fluoride substrate, which is deposited on the surface of the base film, the thickness of the magnesium fluoride substrate is 208 angstroms;

[0069] Al2O3 film layer, which is deposited on the surface of the magnesium fluoride substrate, the thickness of the Al2O3 film layer is 336 angstroms;

[0070] Hafnium oxide film layer, which is deposited on the surface of the aluminum oxide film layer, the thickness of the hafnium oxide film layer is 540 angstroms;

[0071] A silicon dioxide film layer, which is deposited on the surface of the hafnium oxide film layer, and the thickness of the silicon dioxide film layer is 720 angstroms;

[0072] The preparation process of the anti-reflection film for OLED flexible display of this embodimen...

Embodiment 3

[0087] A kind of anti-reflection film for OLED flexible display of the present embodiment, its structure comprises:

[0088] The base film, its raw materials include PMMA and COP, the thickness of the base film is 756 angstroms;

[0089] Magnesium fluoride substrate, which is deposited on the surface of the base film, the thickness of the magnesium fluoride substrate is 208 angstroms;

[0090] Al2O3 film layer, which is deposited on the surface of the magnesium fluoride substrate, the thickness of the Al2O3 film layer is 336 angstroms;

[0091] Hafnium oxide film layer, which is deposited on the surface of the aluminum oxide film layer, the thickness of the hafnium oxide film layer is 540 angstroms;

[0092] A silicon dioxide film layer, the surface of which the hafnium oxide film layer is deposited, the thickness of the silicon dioxide film layer is 545 angstroms;

[0093] The preparation process of the anti-reflection film for OLED flexible display of this embodiment inclu...

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Abstract

The invention discloses a preparation technology of an antireflection film for OLED flexible display, and the antireflection film comprises a base layer film which comprises the raw materials of PMMA and COP; the aluminum oxide film layer is deposited above the base layer film, and a magnesium fluoride substrate is arranged between the aluminum oxide film layer and the base layer film; the hafnium oxide film layer is deposited on the surface of the aluminum oxide film layer; and the silicon dioxide film layer is plated on the surface of the hafnium oxide film layer through deposition or dip-coating. By adopting the preparation process of the antireflection film provided by the invention, the prepared antireflection film has extremely high light penetration rate, the light reflectivity is reduced, and the PMMA and COP are used for replacing the traditional TAC film material, so that the machining performance of the antireflection film is improved while the extremely high light penetration rate is achieved.

Description

technical field [0001] The invention belongs to the technical field of display panel film materials, and more specifically, the invention relates to a preparation process of an anti-reflection film for OLED flexible display. Background technique [0002] Anti-reflection coating, also known as anti-reflection coating, its main function is to reduce or eliminate the reflected light from optical surfaces such as lenses, prisms, and plane mirrors, thereby increasing the light transmission of these components and reducing or eliminating stray light in the system. The basic principle of the anti-reflection film is to use the interference phenomenon of light. When the thickness of the anti-reflection film meets certain requirements, the reflected light generated by the visible light injected into the anti-reflection film on both sides of the anti-reflection film becomes coherent light, and the coherent light interacts with each other. Offset is equivalent to most of the light passi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/52H01L51/56C23C14/35C23C14/06C23C16/40C23C16/455C23C14/34C23C14/08
CPCY02E10/549
Inventor 竹文坤何嵘孙囡陈涛罗林袁长迎马寒冰
Owner SOUTHWEAT UNIV OF SCI & TECH
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