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Production process of ultra-clean high-purity hydrogen peroxide

A technology of hydrogen peroxide and production process, applied in the direction of peroxide/peroxy hydrate/peroxyacid/superoxide/ozonide, inorganic chemistry, chemical instruments and methods, etc., can solve the problem of slow decomposition speed and so on , to achieve the effect of improving quality, improving purity and stabilizing chemical properties

Active Publication Date: 2021-11-12
JIANGYIN RUNMA ELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Under normal circumstances, it will slowly decompose into water and oxygen, but the decomposition speed is extremely slow. The way to speed up its reaction speed is to add catalysts - manganese dioxide, etc. or irradiate with short-wave rays

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0059] A production process of ultra-clean high-purity hydrogen peroxide, comprising the following steps:

[0060](1) carry out oxidation treatment with industrial hydrogen peroxide, obtain oxidation treatment hydrogen peroxide, oxidation treatment is divided into the discharge of inert gas and the oxidation of oxidizing agent successively;

[0061] (2) the oxidized hydrogen peroxide obtained above is filtered by an exchange resin to obtain resin-filtered hydrogen peroxide;

[0062] (3) Resin filtration hydrogen peroxide adopts filter membrane to carry out microfiltration process again, and the filtrate that filters obtains is high-purity hydrogen peroxide.

[0063] The discharge of inert gas is:

[0064] Industrial hydrogen peroxide is added in the reactor, then constantly feed inert gas inside the industrial hydrogen peroxide in the reactor, continue 1 hour.

[0065] The inert gas is nitrogen.

[0066] The nitrogen flow rate was 80 mL / min.

[0067] The oxidation of the o...

Embodiment 2

[0082] A production process of ultra-clean high-purity hydrogen peroxide, comprising the following steps:

[0083] (1) carry out oxidation treatment with industrial hydrogen peroxide, obtain oxidation treatment hydrogen peroxide, oxidation treatment is divided into the discharge of inert gas and the oxidation of oxidizing agent successively;

[0084] (2) the oxidized hydrogen peroxide obtained above is filtered by an exchange resin to obtain resin-filtered hydrogen peroxide;

[0085] (3) Resin filtration hydrogen peroxide adopts filter membrane to carry out microfiltration process again, and the filtrate that filters obtains is high-purity hydrogen peroxide.

[0086] The discharge of inert gas is:

[0087] Industrial hydrogen peroxide is added in the reactor, then constantly feeds inert gas inside the industrial hydrogen peroxide in the reactor, lasts 2 hours.

[0088] The inert gas is nitrogen.

[0089] The nitrogen flow rate was 100 mL / min.

[0090] Further preferably, t...

Embodiment 3

[0105] A production process of ultra-clean high-purity hydrogen peroxide, comprising the following steps:

[0106] (1) carry out oxidation treatment with industrial hydrogen peroxide, obtain oxidation treatment hydrogen peroxide, oxidation treatment is divided into the discharge of inert gas and the oxidation of oxidizing agent successively;

[0107] (2) the oxidized hydrogen peroxide obtained above is filtered by an exchange resin to obtain resin-filtered hydrogen peroxide;

[0108] (3) Resin filtration hydrogen peroxide adopts filter membrane to carry out microfiltration process again, and the filtrate that filters obtains is high-purity hydrogen peroxide.

[0109] The discharge of inert gas is:

[0110] Industrial hydrogen peroxide is added in the reactor, then constantly feeds inert gas inside the industrial hydrogen peroxide in the reactor, lasts 1.5 hours.

[0111] The inert gas is nitrogen.

[0112] The nitrogen flow rate was 90 mL / min.

[0113] The oxidation of the...

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Abstract

The invention discloses a production process of ultra-clean high-purity hydrogen peroxide, and relates to the technical field of chemical engineering, and the production process comprises the following steps: (1) oxidizing industrial hydrogen peroxide to obtain oxidized hydrogen peroxide, wherein the oxidizing sequentially comprising discharge of inert gas and oxidation of an oxidizing agent; (2) filtering the obtained oxidized hydrogen peroxide by using exchange resin to obtain resin filtered hydrogen peroxide; and (3) carrying out micro-filtration treatment on the resin filtered hydrogen peroxide by adopting a filter membrane, wherein filtrate obtained by filtration is high-purity hydrogen peroxide. The industrial hydrogen peroxide is treated by the process disclosed by the invention, the purity of the industrial hydrogen peroxide can be greatly improved, so that the industrial hydrogen peroxide can be better applied to a cleaning agent, a corrosive agent and a photoresist remover of a semiconductor crystal wafer, preparation of a high-grade insulating layer in the electronic industry and removal of inorganic impurities in an electroplating solution, the effect is remarkable, and the product quality is improved.

Description

technical field [0001] The invention relates to the technical field of chemical industry, more specifically, it relates to a production process of ultra-clean and high-purity hydrogen peroxide. Background technique [0002] Hydrogen peroxide is an inorganic compound with the chemical formula H2O2. Pure hydrogen peroxide is a light blue viscous liquid, which can be miscible with water in any proportion. It is a strong oxidant. The aqueous solution is commonly known as hydrogen peroxide and is a colorless transparent liquid. Its aqueous solution is suitable for medical wound disinfection, environmental disinfection and food disinfection. Under normal circumstances, it will slowly decompose into water and oxygen, but the decomposition speed is extremely slow. The way to speed up its reaction speed is to add catalysts—manganese dioxide, etc. or irradiate with short-wave rays. [0003] High-purity hydrogen peroxide is one of the indispensable key basic chemical materials in the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B15/013
CPCC01B15/013C01B15/0135C01P2006/80
Inventor 戈士勇何珂汤晓春
Owner JIANGYIN RUNMA ELECTRONICS MATERIAL
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