Semiconductor memory device

Abstract

A semiconductor memory device includes a substrate, an active structure, a shallow trench isolation, and a plurality of word lines. The active structure is arranged in the substrate and comprises a plurality of first active segments and a plurality of second active segments, each first active segment and each second active segment extend towards a first direction in parallel, and the second active segments are arranged on the outer sides of all the first active segments. The shallow trench isolation is arranged in the substrate, surrounds the active structure and comprises a plurality of first parts and a plurality of second parts. The word lines extend in parallel along a second direction and are disposed in the substrate. At least two of the word lines are interleaved with only the second active segments, or at least one of the word lines does not pass through any second portion. Therefore, direct conduction between the word lines and bit lines can be effectively avoided.

Description

technical field [0001] The invention relates to a semiconductor storage device, in particular to a semiconductor storage device including an active structure and shallow trench isolation. Background technique [0002] With the miniaturization of semiconductor devices and the complexity of integrated circuits, the size of components is continuously reduced and the structure is also constantly changing. Therefore, maintaining the performance of small-sized semiconductor components is currently the main goal of the industry. In the semiconductor manufacturing process, it is mostly based on defining a plurality of active regions on the substrate, and then forming required components on the active regions. Generally speaking, the active area is a plurality of patterns formed on the substrate by photolithography, etching and other manufacturing processes. The pitch is also gradually shrinking, making its manufacturing process also face many restrictions and challenges, so that it...

AI Technical Summary

Problems solved by technology

Generally speaking, the active area is a plurality of patterns formed on the substrate by photolithography, etching and other manufacturing processes. The spacing is also gradually shrinking, making its manufacturing process also face many restrictions and challenges, so that it cannot meet product requirements

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