Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Array substrate manufacturing method, array substrate and display panel

A technology of an array substrate and a manufacturing method, applied in the display field, can solve the problems of cracked protective layer, rough particles, liquid crystal bubbles, etc., and achieve the effect of improving smoothness

Active Publication Date: 2021-10-01
HKC CORP LTD
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The embodiments of the present invention provide a method for manufacturing an array substrate, an array substrate, and a display panel, aiming to solve the technical problem in the prior art that the surface particles of the color-resist layer of the array substrate are rough, which causes the protective layer to rupture, thereby causing bubbles in the liquid crystal.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Array substrate manufacturing method, array substrate and display panel
  • Array substrate manufacturing method, array substrate and display panel
  • Array substrate manufacturing method, array substrate and display panel

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0049] refer to Figure 4 , Figure 4 As the first embodiment of the manufacturing method of the array substrate of the present invention, the manufacturing method of the array substrate includes the following steps:

[0050] Step S10, coating a first protective layer on the thin film transistor substrate;

[0051] Optionally, the first protection layer may be silicon nitride material.

[0052] Step S20, forming a color resist layer on the first protective layer;

[0053] The thin film transistor substrate and the color resist layer are in a vacuum state;

[0054] Step S30, applying an alternating electric field with preset electric field parameters above the color-resist layer to eliminate particles on the surface of the color-resist layer;

[0055] The alternating electric field is generated by a radio frequency power supply; the color-resisting layer is the color-resisting layer, and the particles on the surface of the color-resisting layer include hydrocarbon-containin...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an array substrate and a manufacturing method thereof. The manufacturing method of the array substrate comprises the following steps: coating a first protective layer on a thin film transistor substrate; sequentially forming a shading layer and a color resistance layer on the first protective layer; applying an alternating electric field with preset electric field parameters above the color resistance layer to eliminate particles on the surface of the color resistance layer; and forming the array substrate according to the thin film transistor substrate after the particulate matters are eliminated. The technical problem that surface particles of the color resistance layer of the array substrate are rough, so that a protective layer is broken, and liquid crystals generate bubbles is solved, and the technical effect of improving the color resistance layer is achieved.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a method for manufacturing an array substrate, an array substrate and a display panel. Background technique [0002] COA (Color Filter On Array, array substrate and color filter integration) technology is to integrate the original color filter substrate and thin film transistor substrate, that is, to coat the color resist on the completed array substrate to form a color filter layer In the traditional integration technology of array substrate and color filter, the passivation layer on the color resistance layer is cracked or the film quality of the transparent electrode is uneven due to the rough surface particles of the color resistance layer, resulting in color resistance The gas in the passivation layer overflows to the liquid crystal layer, causing the liquid crystal to generate bubbles. Contents of the invention [0003] The embodiments of the present invention p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02F1/1362G02F1/1368
CPCG02F1/136222G02F1/1368
Inventor 卓恩宗朱虹玲韦超都桂卿郑浩旋
Owner HKC CORP LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com