Photolithography equipment and detection method of pupil surface transmittance of lithography equipment

A lithography equipment and transmittance technology, applied in the field of image sensors, can solve problems such as long detection time, and achieve the effects of short detection time, guaranteed imaging contrast, and convenient detection process

Active Publication Date: 2022-03-11
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a lithography equipment to solve the problem that the existing lithography equipment cannot realize the detection process of pupil transmittance online and the detection time is long

Method used

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  • Photolithography equipment and detection method of pupil surface transmittance of lithography equipment
  • Photolithography equipment and detection method of pupil surface transmittance of lithography equipment
  • Photolithography equipment and detection method of pupil surface transmittance of lithography equipment

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Embodiment 2

[0133] The difference from Embodiment 1 is that, in the lithography apparatus in this embodiment, the incident angle of the incident light irradiated on the phase mask can be adjusted, so that the incident light can be irradiated to the phase mask at different incident angles .

[0134] In this embodiment, the incident angle of the incident light irradiated on the phase mask can be adjusted by adjusting the light beam provided by the illumination system. Specifically, for example, the angle of the beam provided by the illumination system is deflected (that is, the beam is a deflectable beam), and then the projected beam is deflected, and the incident light irradiated on the phase mask is correspondingly deflected.

[0135] Image 6 It is a schematic diagram of the optical path when the incident light irradiated onto the phase reticle is deflected in the lithography apparatus with pupil transmittance detection function in Embodiment 2 of the present invention; Figure 7 It is...

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Abstract

The invention provides a lithographic equipment and a method for detecting pupil transmittance of the lithographic equipment. According to the phase mask with the energy constant of the sub-beam, the corresponding incident energy of the sub-beam or the ratio of the incident energy of the sub-beam is obtained, and a detection device is also integrated in the lithography equipment, so that the detection device can realize online acquisition of the sub-beam The emitted energy can then be used to obtain the detection result of the pupil surface transmittance. That is, the lithographic equipment in the present invention is integrated with the pupil transmittance detection function, so that the detection process can be performed online, which not only facilitates the detection method, but also effectively shortens the detection time.

Description

technical field [0001] The present invention relates to the technical field of image sensors, in particular to a lithographic equipment and a method for detecting pupil transmittance of the lithographic equipment. Background technique [0002] With the development of projection lithography technology, the performance of the projection optical system of lithography equipment has been gradually improved. At present, lithography equipment has been successfully applied in the field of integrated circuit manufacturing with submicron and deep submicron resolution. And, in order to adapt to the technological requirements of integrated circuit manufacturing breaking through 45nm, 32nm and 22nm technology nodes, lithography equipment must also improve its imaging resolution, and one of the ways to improve imaging resolution is to increase the objective lens system of lithography equipment. Numerical aperture NA, however, using an objective system with a large numerical aperture will ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F1/26
CPCG03F7/70591G03F7/7085G03F1/26
Inventor 田毅强孙文凤
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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