Substrate processing apparatus

A substrate processing device and substrate technology, applied in transportation and packaging, cleaning methods using liquids, cleaning methods and utensils, etc., can solve problems such as adhesion, liquid component scattering, liquid loss, etc., and achieve the effect of preventing scattering

Active Publication Date: 2020-11-17
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this type of transfer, there is a problem that the liquid is lost from the substrate during the transfer, or the surface of the substrate is exposed due to evaporation of the liquid, or the liquid component is scattered around and adheres to the inside of the device.

Method used

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  • Substrate processing apparatus
  • Substrate processing apparatus
  • Substrate processing apparatus

Examples

Experimental program
Comparison scheme
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Embodiment Construction

[0108] Figure 1A and Figure 1B It is a figure which shows the schematic structure of one Embodiment of the substrate processing apparatus of this invention. More specifically, Figure 1A It is a plan view showing the substrate processing apparatus 1 as one embodiment of the present invention, Figure 1B It is a side view showing the substrate processing apparatus 1 . In addition, these figures do not show the appearance of the device, but are schematic diagrams showing the internal structure clearly and easily by excluding the outer wall panels or other partial structures of the device. The substrate processing apparatus 1 is, for example, installed in a clean room to perform predetermined processing on a substrate.

[0109] Here, as the "substrate" in this embodiment, a semiconductor substrate, a glass substrate for a photo mask, a glass substrate for a liquid crystal display, a glass substrate for a plasma display, and a field emission display (Field Emission Display, FE...

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PUM

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Abstract

Provided is a substrate processing apparatus capable of reliably preventing a liquid from scattering and realizing substrate conveyance between chambers in a substrate processing apparatus that conveys a substrate coated with the liquid between the chambers. The substrate processing apparatus includes a base portion (1541) disposed adjacent to a chamber; a robot (155) that holds the substrate (S);a robot arm (1542) that is attached to the base section (1541), supports the robot hand, and moves the robot hand forward and backward by moving the robot hand horizontally with respect to the base section; and a cover part (156) which accommodates the manipulator in the internal space. The cover part is provided with: a cover body (1561) forming an internal space; and an extension member (1562)that has a hollow structure that penetrates in the horizontal direction and has one end that forms an opening (1562a), and that engages with the cover body in a state in which the opening communicateswith the internal space and is movable in the horizontal direction.

Description

technical field [0001] The present invention relates to a substrate processing apparatus for transferring a liquid-covered substrate between a plurality of chambers. Background technique [0002] In the processing steps of various substrates such as semiconductor substrates and glass substrates for display devices, when the processing of the substrates is sequentially performed using a plurality of chambers, it is necessary to transfer the substrates between the chambers. At this time, in order to prevent the exposure of the surface of the substrate or the collapse of the fine pattern formed on the surface, etc., the substrate in a horizontal position may be covered with liquid, that is, conveyed in a state where the upper surface of the substrate is covered with a liquid film. In such a transfer form, there is a problem that the liquid is lost from the substrate during the transfer, or the liquid evaporates to expose the substrate surface, or the liquid component scatters a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/677H01L21/67
CPCH01L21/67706H01L21/67742H01L21/6773H01L21/67034H01L21/67051H01L21/67178H01L21/67748H01L21/02057H01L21/67751H01L21/67196H01L21/6715H01L21/67017H01L21/68707B08B7/0021H01L21/02041B08B3/08
Inventor 河原启之桥本光治菊本宪幸墨周武
Owner DAINIPPON SCREEN MTG CO LTD
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