Annealing machine table, leakage rate detection device and detection method

Abstract

The invention provides an annealing machine table, a leakage rate detection device and method. The leakage rate detection device comprises a pressure detection module, a flow regulation module and a calculation module, wherein the flow regulation module is used for controlling the flow of a gas when the gas is exhausted from a process chamber after a first preset time so as to control the pressurein the process chamber, and stopping exhausting the gas when the pressure in the process chamber reaches a preset pressure so as to seal the process chamber, a first pressure value of the process chamber in a second preset time and a second pressure value of the process chamber in a third preset time are obtained through the pressure detection module after gas exhausting is stopped, and the calculation module is used for calculating the leakage rate of the process chamber according to the first pressure value and the second pressure value. According to the invention, the leakage rate of the process chamber can be effectively obtained, so that the leakage rate detection precision of the process chamber is improved.

Description

technical field [0001] The invention relates to the field of semiconductor manufacturing, in particular to a leak rate detection device, a detection method and an annealing machine. Background technique [0002] At present, the annealing machine usually needs to detect the leak rate of its process chamber to measure the sealing of the process chamber. The existing technology usually uses an oxygen detection device to detect the leak rate of the process chamber, and the oxygen detection device is generally installed on the exhaust pipeline of the process chamber. Usually, the method of using the oxygen detection device to detect the leak rate of the process chamber includes , nitrogen gas is introduced into the process chamber, and when the oxygen concentration in the process chamber is zero or close to zero, the gas in the process chamber is discharged to the probe of the oxygen detection device through the exhaust pipeline, and the probe detects the oxygen concentration in ...

AI Technical Summary

Problems solved by technology

After the detection is completed, the electrode needs to be cleaned by nitrogen gas to clean the oxygen ions in the electrode, which will cause the oxidation of the electrode and incomplete cleaning, which will affect its electrochemical performance and the ability to detect oxygen ions

In addition, when calculating the leak rate by measuring the oxygen concentration in the process chamber, when the oxygen concentration in the surrounding environment of the machine fluctuates, the measurement results will be affected, resulting in inaccurate calculation of the leak rate

Images