A kind of polarizing device and its preparation method

A technology of polarizing device and supporting layer, which is applied in the field of integrated optics to achieve the effect of reducing the difficulty of the process

Active Publication Date: 2021-11-19
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is that when the existing optical polarization device is applied in a large-scale integrated optical circuit, it is necessary to repeatedly prepare a large number of polarization structures to achieve polarization control, resulting in a difficult process.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of polarizing device and its preparation method
  • A kind of polarizing device and its preparation method
  • A kind of polarizing device and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are only some of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of this application.

[0035] Reference herein to "one embodiment" or "an embodiment" refers to a specific feature, structure or characteristic that may be included in at least one implementation of the present application. In the description of the present application, it should be understood that the orientation or positional relationship indicated by the terms "upper", "lower", "top", "bottom" etc. is based on the orientation or positional relationship shown in the drawings, and is only for It ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention relates to the technical field of integrated optics, in particular to a polarizing device and a preparation method thereof. It includes: a support layer and a mode screening layer, the support layer is used to support the mode screening layer; the mode screening layer includes a light absorption layer and a light isolation layer, and the light absorption layer is arranged on the support layer, The light isolating layer is disposed on the light absorbing layer; the light absorbing layer is used for absorbing light in a preset optical waveguide mode. The light-absorbing layer can selectively absorb light waves of TM mode and other high-order modes, and the light-isolating layer can limit the degree of absorption of light wave energy by the light-absorbing layer. The polarization control of the polarizing device described in this application is based on the improvement of the entire circuit substrate. When the optical structure is integrated on the chip on a large scale, the mode screening layer can polarize the light waves in all the optical structures. Screening, so there is no need to repeatedly prepare a large number of polarization control structures on the optical path, which reduces the difficulty of the process.

Description

technical field [0001] The invention relates to the technical field of integrated optics, in particular to a polarizing device and a preparation method thereof. Background technique [0002] The development of information technology has always pursued greater integration and faster information processing speed. In recent years, due to the physical principle of microelectronics technology, it is difficult to continue to improve the size and performance of the basic element transistor. In order to continue to increase the speed of information processing, people think of using another information carrier - photon. Compared with electrons, photons have more stable and controllable modulation and multiplexing dimensions, such as amplitude, phase, wavelength, polarization state, mode, etc., and have larger bandwidth, higher spectrum utilization and communication capacity. Integrated photonics technology, with its advantages of high integration, small size, and compatibility with...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G02B6/126G02B6/12G02B6/13
CPCG02B6/12004G02B6/126G02B6/13G02B2006/12085G02B2006/12116G02B2006/12157G02B2006/12166
Inventor 欧欣王成立
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap