Etching solution for multilayer film of active matrix organic light emitting diode display
A light-emitting diode and active matrix technology, which is applied in the field of etching solution for multilayer thin films of active matrix organic light-emitting diode displays, can solve the problems of inaccurate etching angle, weak etching solution permeability, and affecting etching effect, etc. , to achieve the effect of smooth etching lines, improved permeability, and improved uniformity
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Embodiment 1
[0023] This embodiment provides an etching solution for multilayer thin films of active matrix organic light-emitting diode displays, including the following components calculated by mass percentage: 45% phosphoric acid, 1% nitric acid, 5% malic acid, 0.2% penetrant, 10% nitrosyl chloride and 1% dihydrogen phosphate, and the balance is deionized water.
Embodiment 2
[0025] This embodiment provides an etching solution for multilayer thin films of active matrix organic light-emitting diode displays, including the following components calculated by mass percentage: 15% phosphoric acid, 10% nitric acid, 25% malic acid, 0.6% penetrant, 14% nitrosyl chloride and 8% dihydrogen phosphate, and the balance is deionized water.
Embodiment 3
[0027] This embodiment provides an etching solution for multilayer thin films of active matrix organic light-emitting diode displays, including the following components calculated by mass percentage: 30% phosphoric acid, 5.5% nitric acid, 15% malic acid, 0.4% penetrant, 12% nitrosyl chloride and 4.5% dihydrogen phosphate, and the balance is deionized water.
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