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Etching solution for multilayer film of active matrix organic light emitting diode display

A light-emitting diode and active matrix technology, which is applied in the field of etching solution for multilayer thin films of active matrix organic light-emitting diode displays, can solve the problems of inaccurate etching angle, weak etching solution permeability, and affecting etching effect, etc. , to achieve the effect of smooth etching lines, improved permeability, and improved uniformity

Inactive Publication Date: 2020-09-25
江苏中德电子材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] For this reason, an embodiment of the present invention provides an etching solution for an active matrix organic light-emitting diode display multilayer film to solve the problem of weak permeability of the etching solution, low etching efficiency, and inaccurate etching angle in the prior art. , have seriously affected the etching effect

Method used

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  • Etching solution for multilayer film of active matrix organic light emitting diode display

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Effect test

Embodiment 1

[0023] This embodiment provides an etching solution for multilayer thin films of active matrix organic light-emitting diode displays, including the following components calculated by mass percentage: 45% phosphoric acid, 1% nitric acid, 5% malic acid, 0.2% penetrant, 10% nitrosyl chloride and 1% dihydrogen phosphate, and the balance is deionized water.

Embodiment 2

[0025] This embodiment provides an etching solution for multilayer thin films of active matrix organic light-emitting diode displays, including the following components calculated by mass percentage: 15% phosphoric acid, 10% nitric acid, 25% malic acid, 0.6% penetrant, 14% nitrosyl chloride and 8% dihydrogen phosphate, and the balance is deionized water.

Embodiment 3

[0027] This embodiment provides an etching solution for multilayer thin films of active matrix organic light-emitting diode displays, including the following components calculated by mass percentage: 30% phosphoric acid, 5.5% nitric acid, 15% malic acid, 0.4% penetrant, 12% nitrosyl chloride and 4.5% dihydrogen phosphate, and the balance is deionized water.

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Abstract

The invention discloses an etching solution for a multilayer film of an active matrix organic light emitting diode display. The etching solution comprises the following components in percentage by mass: 15 to 45% of phosphoric acid, 1 to 10% of nitric acid, 5 to 25% of malic acid, 0.2 to 0.6% of a penetrating agent, 10 to 14% of nitrosyl chloride, 1 to 8% of dihydric phosphate and the balance of deionized water. The components and the use amounts of the provided etching solution are reasonable, and nitric acid, malic acid and nitrosyl chloride are matched for use, and the etching solution is high in permeability, high in etching efficiency, accurate in etching angle, smooth and uniform in etching line and free of residues. Besides, a mixture prepared in the step 2 is subjected to standingfor 10 seconds or longer, then the mixture is put into a stirring machine with a rotating speed of 1000 r / min and stirred, the penetrating agent and malic acid can be fully mixed into the mixture, andtherefore the uniformity of the etching solution is improved.

Description

technical field [0001] The invention belongs to the technical field of chemical industry, and in particular relates to an etchant for multilayer thin films of active matrix organic light emitting diode displays. Background technique [0002] An active matrix organic light emitting diode display is an accessory device used to display a certain electronic file transmitted through a specific transmission device and reflect it to the human eye so that the user can obtain the desired information. It has been widely used in the displayed field. Etching solution is a kind of liquid that uses the characteristics of eroding materials to carry out engraving, and has a wide range of uses in current industrial production, especially in the field of microelectronic processing. However, currently there are few etchant solutions used for multilayer thin films of active matrix organic light-emitting diode displays, and the etchant has weak permeability, low etching efficiency, and inaccura...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K13/06H01L27/32
CPCC09K13/06H10K59/12H10K59/1201
Inventor 戈士勇何珂陆水忠
Owner 江苏中德电子材料科技有限公司
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