A 10g anti-reflection laser and its preparation process
A preparation process and anti-reflection technology, which can be applied to the structure of optical resonator cavity and the structure of optical waveguide semiconductor, and can solve problems such as disturbance.
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Embodiment 1
[0048] Embodiment 1: mask layer pattern size L 宽 2um, L 长 100um, lateral etching distance L 3 It is 0um, and the secondary crystal growth temperature is 650°C. L 1 20μm; L 2 is 20nm; in step 2, the etching solution ratio is Br 2 :H 3 PO 4 :H 2 O=2:1:10, the etching solution temperature is 21 degrees Celsius.
Embodiment 2
[0049] Embodiment 2: mask layer pattern size L 宽 25um, L 长 200um, lateral etching distance L 3 It is 1um, and the secondary crystal growth temperature is 700°C. L1 45μm; L 2 is 60nm; in step 2, the etching solution ratio is Br 2 :H 3 PO 4 :H 2 O=2:1:15, the temperature of the etching solution is 21.5 degrees Celsius.
Embodiment 3
[0050] Embodiment 3: mask layer pattern size L 宽 50um, L 长 300um, lateral etching distance L 3 It is 2um, and the secondary crystal growth temperature is 750°C. L 1 70μm; L 2 is 100nm; in step 2, the etching solution ratio is Br 2 :H 3 PO 4 :H 2 O=2:1:20, the temperature of the etching solution is 22 degrees Celsius.
[0051] The invention discloses a preparation process of a 10G anti-reflection laser, which comprises a substrate and an active region sequentially arranged on the substrate, a first cladding layer and a diffraction grating layer, and one end of the first cladding layer and the diffraction grating layer is provided with an end face The bottom of the end-face etching area is located in the substrate, and an anti-reflection improving layer is grown in the end-face etching area; the diffraction grating layer and the anti-reflection layer are sequentially covered with a second cladding layer, a contact layer and a p-metal electrode layer, The lower surface o...
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Abstract
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