A high-precision etching transfer method for micro-nano structure patterns on curved substrates

Abstract

The invention relates to a high-precision etching transfer method for micro-nano structure patterns on a curved substrate. Using methods such as vacuum thermal evaporation and magnetron sputtering deposition, a layer of conductive film is prepared on the surface of curved substrates made of quartz, silicon, etc., and then through glue coating, photolithography, direct writing, wet etching or dry etching The patterned conductive film consistent with the microstructure pattern is prepared by etching and other processes, and then the conductive film layer around the curved substrate is connected to the lower electrode of the sample stage by using the metal shell and conductive tape to ensure good conductive contact and form an equipotential body. Reactive ion etching is then performed. The method can ensure that the potential of the etching area on the curved substrate is consistent, so that the exposed area of ​​the entire curved substrate is uniformly etched, and the area covered by the metal conductive film is protected. The patterned metal thin film in the invention is not only a mask but also an electrode, which solves the problem of uneven etching transmission of micro-nano structure patterns on curved substrates of dielectric materials such as quartz and silicon.

Description

technical field [0001] The invention relates to the field of preparation of nano-microstructures on curved substrates, in particular to a high-precision etching transfer method for micro-nano structure patterns on curved substrates. Background technique [0002] Diffractive optical elements such as Fresnel lenses, diffraction gratings, and holographic gratings mainly use the diffraction microstructure on the surface of the device to modulate the phase, amplitude, and polarization of light waves to achieve beam smoothing, focusing, collimation, beam splitting, and beam combining. Function. Compared with traditional optical components, the diffractive optical system has the characteristics of high integration, multiple functions, small size, and light weight. Restricted by the processing capacity, most of the diffractive optical elements currently use flat substrates, while the curved substrate diffractive optical elements are mostly used in the infrared band that does not re...

AI Technical Summary

Problems solved by technology

[0005] The invention aims at the problem of poor etching depth uniformity in the preparation process of the micro-nano structure pattern of the curved surface substrate of quartz and silicon materials, and proposes a curved surface substrate etching method, which can prepare curved surface microstructures with good etching depth uniformity. nanostructure graphics

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