A Measuring System and Measuring Method Considering Focusing, Leveling and Precise Alignment
A measurement system, focusing and leveling technology, applied in the field of lithography machine, can solve the problems of long production time, low yield of lithography machine, high space occupancy rate of lithography machine, etc., to reduce space requirements and realize focus adjustment Peaceful and precise alignment effect
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[0024] In order to make the purpose, technical solution and advantages of the device of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0025] refer to figure 1 , the measurement system includes a six-degree-of-freedom nano-motion stage 1; a film-supporting stage 2, which is installed on the six-degree-of-freedom nano-motion stage 1; a silicon wafer 3 to be exposed; an exposure mask 4, which is fixed by a mask holding device 6; Substrate 5; mask holding device 6, fixed on the main substrate 5; alignment mark 7 on the substrate; gap measurement mark 8 on the mask; alignment mark area 9 on the mask; illumination source lens 10; 1. The second X\Y axis displacement table 100\200; the first and second Tz axis rotation table 101\201 are respectively installed on the first and second X\Y axis displacement table 100\200; the first and the second Two inclined adapter plates 102\202 are resp...
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