Winding type optical coating device and method based on magnetron sputtering and electron gun evaporation

Abstract

The invention discloses a winding type optical coating device and method based on magnetron sputtering and electron gun evaporation. The device comprises a plurality of vacuum chambers which are linearly connected, wherein two vacuum chambers positioned at two ends are an unwinding chamber and a winding chamber respectively; at least one magnetron sputtering coating chamber and at least one electron gun evaporation coating chamber are arranged between the unwinding chamber and the winding chamber; and when a plurality of magnetron sputtering coating chambers and / or electron gun evaporation coating chambers are arranged, the magnetron sputtering coating chambers and the electron gun evaporation coating chambers are alternately arranged. The method comprises the following steps of alternately performing magnetron sputtering coating treatment and electron gun evaporation coating treatment on a base material, and coating a silicon oxide optical film or a silicon oxide / titanium oxide optical film. According to the winding type optical coating device and method disclosed by the invention, the magnetron sputtering coating and electron gun evaporation coating are combined, so that high binding force is formed between the film and a workpiece or the base material while the structural compactness of the film can be guaranteed, the coating effect of the workpiece or the base material is effectively improved, and the optical performance of the coated product is improved.

Description

technical field [0001] The invention relates to the technical field of vacuum coating, in particular to a winding optical coating device and method based on magnetron sputtering and electron gun evaporation. Background technique [0002] In the field of vacuum coating, silicon oxide optical film and silicon oxide / titanium oxide optical film are generally processed by magnetron sputtering coating, but in the existing processing technology and processing equipment, this processing method often has the following obvious defects: [0003] (1) The structure of the film layer formed by magnetron sputtering coating process is generally relatively dense, and the bonding force with the substrate is weak, so it is difficult to form a good film layer, which affects the optical properties of the coated product; [0004] (2) The film forming speed of magnetron sputtering coating is relatively slow, so it is difficult to form a thicker film layer on the surface of the substrate, and the c...

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Problems solved by technology

[0003] (1) The structure of the film layer formed by magnetron sputtering coating process is generally relatively dense, and the bonding force with the substrate is weak, so it is difficult to form a good film layer, which affects the optical properties of the coated product;

[0004] (2) The film forming speed of magnetron sputtering coating is relatively slow, so it is difficult to form a thicker film layer on the surface of the substrate, and the coating effect is difficult to achieve an ideal state;

[0005] (3) In the silicon oxide film layer, there are often parts of silicon oxide with weak adhesion, which are easy to attach to the surface of the film layer in a free state, which affects the cleanliness of the product after coating, and also reduces the transparency of the film layer, thereby Affect the optical properties of the film layer

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