Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Coating of polysilicon reduction furnace, preparation method of coating, polysilicon reduction furnace and uses of polysilicon reduction furnace

A technology of polysilicon and reduction furnace, which is applied in the field of polysilicon reduction furnace, coating and preparation of polysilicon reduction furnace, can solve the problems of high porosity and weak bonding strength, and achieve low porosity, low oxidation rate and high bonding strength Effect

Active Publication Date: 2020-06-26
ASIA SILICON QINGHAI +1
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the bonding strength between the currently prepared coating and the polysilicon reduction furnace is weak and the porosity is high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0033] In one aspect of the present invention, the present invention provides a kind of preparation method of the coating of polysilicon reduction furnace, and this preparation method comprises:

[0034] Spraying the first particles on the surface of the polysilicon reduction furnace in contact with the material to form a base layer by using the first cold gas dynamic spraying;

[0035] Spraying second particles on the surface of the base layer away from the polysilicon reduction furnace by means of the second cold gas dynamic spraying to form a surface layer,

[0036] Wherein, the velocity of the first particles of the first cold gas dynamic spraying and the velocity of the second particles of the second cold gas dynamic spraying are both supersonic, and the velocity of the first particles is greater than that of the second particles speed;

[0037] The base layer and the facing layer are adapted to reflect infrared radiation.

[0038] It should be noted that the surface of...

Embodiment 1

[0069] The preparation method of the coating of polysilicon reduction furnace comprises the following steps:

[0070] A gold coating is formed on the surface of the contact material of the bell jar, chassis and electrodes of the polysilicon reduction furnace, and the gold coating is composed of a base layer and a surface layer;

[0071] The base layer, the first gold powder composed of 60V% irregular gold powder with water chestnut and 40V% spherical gold powder, is sprayed on the surface of the polysilicon reduction furnace by using an industrial gas power spray gun at a spraying temperature of 650°C and a spraying pressure of 5MPa made;

[0072] The surface layer, the second gold powder composed of 5V% irregular gold powder with water chestnut and 95V% spherical gold powder, is sprayed on the surface of the base layer by using an industrial gas power spray gun at a spraying temperature of 600°C and a spraying pressure of 3.5MPa made;

[0073] Among them, the particle size ...

Embodiment 2

[0076] The preparation method of the coating of polysilicon reduction furnace comprises the following steps:

[0077] A silver coating is formed on the surface of the contact material of the bell jar, chassis and electrodes of the polysilicon reduction furnace.

[0078] The silver coating consists of a base layer and a surface layer;

[0079] The base layer, the first silver powder composed of 80V% irregular silver powder with water chestnut and 20V% spherical silver powder, is sprayed on the surface of the polysilicon reduction furnace by using an industrial gas power spray gun at a spraying temperature of 550°C and a spraying pressure of 5MPa made;

[0080] The surface layer is composed of 10V% irregular silver powder with water chestnut and 90V% spherical silver powder, which is formed on the surface of the base layer by using an industrial gas power spray gun at a spraying temperature of 500°C and a spraying pressure of 5MPa. ;

[0081] Wherein, the particle size of the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a coating of a polysilicon reduction furnace, a preparation method of the coating, the polysilicon reduction furnace and uses of the polysilicon reduction furnace, and relates to the field of polysilicon technical equipment in production. The preparation method of the coating of the polysilicon reduction furnace comprises the steps of spraying first particles on the surface,in contact with materials, of the polysilicon reduction furnace by virtue of first cold gas dynamic spraying to form a base layer, and spraying second particles on the surface, away from the polysilicon reduction furnace, of the base layer by virtue of second cold gas dynamic spraying to form a surface layer. The speed of the first particles of the first cold gas dynamic spraying and the speed ofthe second particles of the second cold gas dynamic spraying are both supersonic speed, and the speed of the first particles is greater than the speed of the second particles. The base layer and thesurface layer are suitable for reflecting infrared radiation. The spraying speed of the first particles forming the base layer is higher, so that the bonding strength of the base layer and the surfaceof the polysilicon reduction furnace is higher. The spraying speed of the second particles forming the surface layer is lower so as to facilitate the reduction of the spraying cost of the coating.

Description

technical field [0001] The invention relates to the field of polysilicon production technology and equipment, in particular to a coating of a polysilicon reduction furnace and a preparation method thereof, a polysilicon reduction furnace and applications thereof. Background technique [0002] The main material of the polysilicon reduction furnace is stainless steel. In order to avoid the creep failure of the stainless steel material due to the high temperature of the inner wall during the operation of the polysilicon reduction furnace, low-temperature water is usually passed into the jacket between the outer wall and the inner wall to cool the inner wall. The temperature is kept below 300°C. During the operation of the polysilicon reduction furnace, a large amount of infrared electromagnetic waves are emitted from the surface of the silicon rods, and most of the infrared electromagnetic waves reaching the surface of the inner wall are absorbed and converted into internal hea...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C24/04B22F1/00C01B33/021C01B33/03C01B33/035
CPCC23C24/04C01B33/021C01B33/03C01B33/035B22F1/052
Inventor 张宝顺王体虎宗冰
Owner ASIA SILICON QINGHAI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com