Laser capable of directly generating two paths of coherent light

A laser and coherent light technology, applied in lasers, laser parts, phonon exciters, etc., can solve the problems affecting the effect and quality of interference processing, phase and polarization state changes, inconsistent light intensity, etc., and achieve good interference processing effect. , high reliability and low cost

Pending Publication Date: 2020-06-19
CHANGCHUN UNIV OF SCI & TECH
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Problems solved by technology

[0003] At present, the multi-beam laser interference system uses a laser with a single beam output, uses various beam splitting methods to split the original beam, and then uses a mirror to reflect and intersect each split beam to obtain interference. There are two problems in this beam splitting system. First, the composition of the system has the problems of complex structure, difficult adjustment and low reliability; second, due to the action of multiple transmission media and reflection media in the process of splitting and intersecting a single laser beam, wavefront distortion, phase and polarization state will be generated. Changes, inconsistent light intensity and other phenomena affect the effect and quality of interference processing

Method used

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  • Laser capable of directly generating two paths of coherent light
  • Laser capable of directly generating two paths of coherent light

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Embodiment Construction

[0030] Hereinafter, specific embodiments of the present application will be described in detail with reference to the accompanying drawings. According to these detailed descriptions, those skilled in the art can clearly understand the present application and can implement the present application. Without departing from the principle of the present application, the features in different embodiments can be combined to obtain new implementations, or some features in certain embodiments can be replaced to obtain other preferred implementations.

[0031] The traditional Mach-Zehnder interference lithography apparatus is a dual-beam interference lithography device, and the calibration process is cumbersome. It is necessary to precisely adjust the position of each lens in the optical path, and can only process a single period of nanostructures at a time. If you want to process other periods of Nanopatterns need to readjust the entire set of optical paths, and the process is complicate...

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Abstract

The invention belongs to the technical field of short-pulse laser and particularly relates to a laser capable of directly generating two paths of coherent light. An existing multi-beam laser photoetching device has the defects of excessive devices, low light energy utilization rate, non-uniform interference fringe light intensity distribution and the like. The invention provides the laser capableof directly generating two paths of coherent light. The laser comprises a first laser oscillation assembly, an electro-optic Q-switching assembly and a second laser oscillation assembly which are arranged in sequence, the first laser oscillation assembly comprises a first Dammann transmission grating, a first laser crystal excitation component and a first Dammann reflection grating which are arranged in sequence; the second laser oscillation assembly comprises a second Dammann reflection grating, a second laser crystal excitation component and a second Dammann transmission grating; the first laser crystal excitation component comprises a first pump light source and a first laser crystal, and the second laser crystal excitation component comprises a second pump light source and a second laser crystal. The double-path light interference effect is good, the working efficiency is high, and the reliability is high.

Description

technical field [0001] The application belongs to the technical field of short-pulse lasers, and in particular relates to a laser that directly generates dual-path coherent light with single longitudinal mode mode, phase difference locking, uniform polarization state, and equal light intensity. Background technique [0002] Multi-beam laser interference to make functional surfaces refers to the technology of constructing large-area submicron periodic structures through micro-nano structure processing on the surface of materials. The periodic or quasi-periodic light fields are formed by multi-beam coherent lasers, which can directly affect the surface of materials. Or three-dimensional periodic structures are etched inside, and these periodic structures have special functions, such as self-cleaning, water repellency, hydrophilicity, wear resistance, light trapping and so on. Multi-beam laser interference processing has the advantages of large processing area, flexible process...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/094H01S3/105H01S3/13
CPCH01S3/094H01S3/105H01S3/13
Inventor 李永亮王驰杨超
Owner CHANGCHUN UNIV OF SCI & TECH
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