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Radio frequency introduction device and semiconductor processing device

A technology for introducing devices and semiconductors, applied in semiconductor devices, sustainable manufacturing/processing, metal material coating processes, etc., can solve the problems of low process efficiency, poor safety and stability, poor process performance, etc. Efficiency, passivation improvement, safety and stability improvement

Inactive Publication Date: 2020-05-12
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In view of the shortcomings of the existing methods, this application proposes a radio frequency introduction device and semiconductor processing equipment to solve the technical problems of poor process performance, low process efficiency and poor safety and stability in the prior art

Method used

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  • Radio frequency introduction device and semiconductor processing device
  • Radio frequency introduction device and semiconductor processing device
  • Radio frequency introduction device and semiconductor processing device

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Embodiment Construction

[0023] The present application is described in detail below, and examples of embodiments of the present application are shown in the drawings, wherein the same or similar reference numerals denote the same or similar components or components having the same or similar functions throughout. Also, detailed descriptions of known technologies will be omitted if they are not necessary to illustrate the features of the present application. The embodiments described below by referring to the figures are exemplary only for explaining the present application, and are not construed as limiting the present application.

[0024] Those skilled in the art can understand that, unless otherwise defined, all terms (including technical terms and scientific terms) used herein have the same meanings as commonly understood by those of ordinary skill in the art to which this application belongs. It should also be understood that terms, such as those defined in commonly used dictionaries, should be ...

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Abstract

The embodiment of the invention provide a radio frequency introduction device and a semiconductor processing device. The radio frequency introduction device is used for introducing radio frequency toa cassette located inside a semiconductor process furnace, and comprises a supporting mechanism, a front radio frequency mechanism and a rear radio frequency mechanism. The supporting mechanism comprises a supporting rod, the first end of the supporting rod is connected with a furnace opening of the semiconductor process furnace, and the second end of the supporting rod is connected with the furnace tail of the semiconductor process furnace; the front radio frequency mechanism and the rear radio frequency mechanism are arranged on the supporting rod in parallel and used for bearing the cassette; the front radio frequency mechanism is arranged close to the first end of the supporting rod, and the rear radio frequency mechanism is arranged close to the second end of the supporting rod; and the front radio frequency mechanism is electrically connected with one end of the cassette, and the rear radio frequency mechanism is electrically connected with the other end of the cassette. According to the device, the radio frequency of the cassette is introduced in two directions, so that the current direction between positive and negative electrodes of the cassette in the semiconductor process furnace is changed, and then the uniformity and passivation effect of the process are improved.

Description

technical field [0001] The present application relates to the technical field of semiconductor processing, and in particular, the present application relates to a radio frequency introduction device and semiconductor processing equipment. Background technique [0002] At present, solar cells are an important option to solve increasingly severe energy and environmental problems, and crystalline silicon cells have always occupied a pivotal market share in the entire photovoltaic industry due to their advantages in cost and efficiency. After years of research and development, people have realized that light management (Light Management) and passivation (Passivating) are effective ways to improve the efficiency of crystalline silicon cells. Generally speaking, light management is mainly the treatment of the light-receiving surface of the battery, including surface texturing and adding an anti-reflection film, thereby greatly improving the absorption of incident sunlight; Electr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/509C23C16/458H01L31/18
CPCC23C16/458C23C16/509H01L31/1804H01L31/1868Y02P70/50
Inventor 姜艳杰王晓飞
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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