A red phosphorus/zinc oxide heterojunction film using screen LED photocatalytic disinfection, preparation method and application
A zinc oxide and heterojunction technology, applied in coatings and other directions, can solve the problems of low charge separation efficiency, limited activity, poor photocatalytic efficiency of ZnO, etc., and achieves low implementation difficulty, good light transmittance, and improved photocatalytic activity. Effect
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Embodiment 1
[0054] A method for preparing a red phosphorus-zinc oxide heterojunction thin film utilizing LED photocatalytic disinfection, comprising the following steps:
[0055] Step 1, pretreatment of the substrate, placing the substrate in acetone, absolute ethanol and deionized water for 15 minutes, and then drying it naturally at room temperature, and the substrate is glass;
[0056] Step 2, preparing red phosphorus film,
[0057] The surface of the substrate obtained after step 1 is completed adopts chemical vapor deposition (CVD) to prepare a red phosphorus film, including:
[0058] 1) Red phosphorus powder pretreatment, put the red phosphorus powder at 200°C, hydrothermally treat it for 12 hours, and slowly lower it to room temperature, then vacuum-dry the obtained powder, and then grind it to less than 100 microns to complete the red phosphorus powder pretreatment;
[0059] 2) Put the pretreated red phosphorus and cleaned quartz glass in a CVD furnace to carry out the preparatio...
Embodiment 2
[0063] A method for preparing a red phosphorus-zinc oxide heterojunction thin film utilizing LED photocatalytic disinfection, comprising the following steps:
[0064] Step 1, pretreatment of the substrate, placing the substrate in acetone, absolute ethanol and deionized water for 15 minutes, and then drying it naturally at room temperature, and the substrate is glass;
[0065] Step 2, preparing red phosphorus film,
[0066] The surface of the substrate obtained after step 1 is completed adopts chemical vapor deposition (CVD) to prepare a red phosphorus film, including:
[0067] 1) Red phosphorus powder pretreatment, put the red phosphorus powder at 200°C, hydrothermally treat it for 12 hours, and slowly lower it to room temperature, then vacuum-dry the obtained powder, and then grind it to less than 100 microns to complete the red phosphorus powder pretreatment;
[0068] 2) Put the pretreated red phosphorus and cleaned quartz glass in a CVD furnace to carry out the preparatio...
Embodiment 3
[0072] A method for preparing a red phosphorus-zinc oxide heterojunction thin film utilizing LED photocatalytic disinfection, comprising the following steps:
[0073] Step 1, pretreatment of the substrate, placing the substrate in acetone, absolute ethanol and deionized water for 15 minutes, and then drying it naturally at room temperature, and the substrate is glass;
[0074] Step 2, preparing red phosphorus film,
[0075] The surface of the substrate obtained after step 1 is completed adopts chemical vapor deposition (CVD) to prepare a red phosphorus film, including:
[0076] 1) Red phosphorus powder pretreatment, put the red phosphorus powder at 200°C, hydrothermally treat it for 12 hours, and slowly lower it to room temperature, then vacuum-dry the obtained powder, and then grind it to less than 100 microns to complete the red phosphorus powder pretreatment;
[0077] 2) Put the pretreated red phosphorus and cleaned quartz glass in a CVD furnace to carry out the preparatio...
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