Nano invisible mask and manufacturing process thereof
An invisible and nano technology, applied in the field of beauty and skin care products, which can solve the problems of easily deteriorating nutrients, susceptible to bacteria, and unable to guarantee the nutrients of nanofibers.
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Embodiment 1
[0058] A preparation method based on nano invisible mask, comprising the following steps:
[0059] Step 1): In terms of mass fraction, polyamide (PA6) with 15% mass fraction as the solute is dissolved in a mixed solvent of formic acid and acetic acid with a mass fraction of 84% to form an electrospinning liquid, and the ratio of formic acid and acetic acid is 1:2 (ie " The mass ratio of formic acid and acetic acid is 1:2"), fully stirred evenly, and left to defoam, wherein, the stirring speed was 500r / min, and the stirring time was 4h;
[0060] Step 2): then add the nanometer SiO of 1% mass fraction 2 The particles are stirred by ultrasonic vibration in the above-mentioned electrospinning liquid, the stirring speed of ultrasonic vibration is 500r / min, and the stirring time is 4h; the nano-SiO 2 The particle size is 45nm;
[0061] Step 3) The solution obtained after step 2) is spun with an Elmarco electrospinning machine, and the non-woven fabric substrate is used as the bott...
Embodiment a
[0067] A kind of preparation method based on nano invisible mask comprises the following steps:
[0068] Step 1): In terms of mass fraction, 30% mass fraction of polyamide (PA66) is used as a solute, dissolved in 65% mass fraction of formic acid solvent to form an electrospinning solution, fully stirred evenly, and left to stand for defoaming, wherein, stirring Speed 600r / min, stirring time 6h;
[0069] Step 2): then add the nano-SiO of 5% mass fraction 2 The particles are stirred by ultrasonic vibration in the above-mentioned electrospinning liquid, the stirring speed of ultrasonic vibration is 500r / min, and the stirring time is 4h; the nano-SiO 2 The particle size is 100nm;
[0070]Step 3) The solution obtained after step 2) is spun with an Elmarco electrospinning machine, and the non-woven fabric substrate is used as the bottom layer of the substrate, and the nanofiber layer is obtained by spinning on the bottom layer of the substrate, and then in the nanometer The fib...
Embodiment b
[0075] A kind of preparation method based on nano invisible mask comprises the following steps:
[0076] Step 1): In terms of mass fraction, 3% mass fraction of polyamide (PA46) is used as the solute, dissolved in 96.9% mass fraction of acetic acid solvent to form an electrospinning solution, fully stirred evenly, and left to stand for defoaming, wherein, stirring Speed 300r / min, stirring time 2h;
[0077] Step 2): then add the nanometer SiO of 0.1% mass fraction 2 The particles are stirred by ultrasonic vibration in the above electrospinning solution, the stirring speed of ultrasonic vibration is 200r / min, and the stirring time is 4h; the nano-SiO 2 The particle size is 300nm;
[0078] Step 3) The solution obtained after step 2) is spun with an Elmarco electrospinning machine, and the non-woven fabric substrate is used as the bottom layer of the substrate, and the nanofiber layer is obtained by spinning on the bottom layer of the substrate, and then in the nanometer The ...
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