A metal micro-component interconnection method based on electrochemical deposition
A technology for depositing metal and micro-components, which is applied to electrolytic components, electrolytic processes, cells, etc., can solve the problems of low success rate of metal micro-components, and achieve the effects of short preparation cycle, low preparation cost, and improved success rate.
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[0036] In order to make the purpose, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0037] to combine figure 1 and figure 2 Note that the interconnected metal micro-components in this embodiment are two micro copper wires, the length of the micro copper wires is 100 μm, and the radius is 10 μm. One end of one of the micro-copper wires is in vertical contact with the middle of another micro-copper wire, and the contact point is a connection point. The electrolyte used in this embodiment has a concentration of 200mol / m 3 copper sulfate solution;
[0038] In this embodiment, the metal micro-component interconnection method based on electrochemical deposition is carried out ac...
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