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Hollow annular tungsten electrode GTA array wire filling additive manufacturing method and device

A technology of additive manufacturing and tungsten electrode, which is applied in the field of additive manufacturing of hollow annular tungsten electrode GTA array wire filling, which can solve the problems of poor stability of arc pressure molten pool and low stacking efficiency, so as to enhance coaxiality and improve stacking efficiency Effect

Inactive Publication Date: 2019-10-18
SOUTHWEST JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to solve the problem of poor stability of the molten pool and low stacking efficiency caused by excessive arc pressure during the high current accumulation of the existing GTA wire-filled additive manufacturing, and to provide a hollow annular tungsten electrode GTA array wire-filled additive manufacturing Method and device

Method used

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  • Hollow annular tungsten electrode GTA array wire filling additive manufacturing method and device
  • Hollow annular tungsten electrode GTA array wire filling additive manufacturing method and device
  • Hollow annular tungsten electrode GTA array wire filling additive manufacturing method and device

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Embodiment 1

[0032] The test platform of this embodiment is as follows: the GTA wire-filling additive manufacturing power supply is Fronius MW300, the wire feeder model is KD4010, the motion actuator is a MOTOMAN robot, the GTA gun is fixed on the end of the sixth axis of the MOTOMAN robot through a clamp, and the robot controls GTA movement. The substrate size is 300mm×200mm×6mm.

[0033] A hollow annular tungsten electrode GTA array wire-filled additive manufacturing method, using a hollow annular tungsten electrode, the wall thickness d between the outer surface and the inner surface of the hollow annular tungsten electrode is 1.0-4.0mm, the annular tungsten electrode The outer diameter D is 3-10mm, and the outer surface and the bottom of the inner surface of the annular tungsten electrode are provided with a chamfer α, and the value range of α is 30-60°, and the surface of the tungsten electrode between the chamfers forms a circular platform, The circular platform is used to limit the...

Embodiment 2

[0039] This embodiment provides a hollow annular tungsten electrode GTA array filling wire additive manufacturing device,

[0040] Including GTA power supply 1, metal wire 2, electrode clamp 3, hollow annular tungsten electrode 4, arc 5, accumulation layer 6, substrate 7, the positive pole of the GTA power supply 1 is connected to the substrate 7, the negative pole of the GTA power supply 1 is connected to the electrode clamp 3 connection, the outer surface of the hollow annular tungsten electrode 4 cooperates with the electrode holder 3, and the arc 5 is established between the hollow annular tungsten electrode 4 and the accumulation layer;

[0041] The wall thickness d between the outer surface and the inner surface of the hollow ring-shaped tungsten electrode is 1.0-4.0mm, the outer diameter D of the ring-shaped tungsten electrode is 3-10mm, and the outer surface and the bottom of the inner surface of the ring-shaped tungsten electrode are both set There is a chamfer α, the...

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Abstract

The invention provides a hollow annular tungsten electrode GTA array wire filling additive manufacturing method and device. The device comprises a hollow annular tungsten electrode, the wall thicknessd between the outer surface and the inner surface of the hollow annular tungsten electrode is 1.0 mm-4.0 mm, each of the bottom of the outer surface and the bottom of the inner surface of the annulartungsten electrode is provided with a chamfer alpha, a circular truncated cone is formed on the surface, between the chamfers, of the tungsten electrode, the chamfers are used for limiting the rangeof electrons emitted by the tungsten electrode, N cylindrical holes are uniformly distributed in the circumferential direction of the annular tungsten electrode, each cylindrical hole penetrates through the whole annular tungsten electrode up and down, and the cylindrical holes are used for feeding metal wires. The hollow annular tungsten electrode can effectively reduce the arc pressure, when larger accumulated current is borne, low arc pressure continues being kept, so that the stability of a molten pool is maintained, and meanwhile, multi-wire arrays are introduced into the annular tungstenelectrode, so that the coaxiality of a GTA heat source and the wires is enhanced, the stacking efficiency of the metal wires is further increased, and the problems that the stability of the molten pool is poor and the stacking efficiency is low during large-current additive manufacturing can be effectively solved.

Description

technical field [0001] The invention belongs to the technical field of arc-filled wire additive manufacturing, and in particular relates to a hollow annular tungsten electrode GTA array wire-filled additive manufacturing method and device. Background technique [0002] Gas Tungsten Arc (GTA) wire-filled additive manufacturing uses GTA arc as the heat source, metal wire as the filling material, and forms metal components layer by layer. Compared with other arc-filled wire-filled additive manufacturing methods, this technology It has the advantages of low equipment cost, good arc stability, independent adjustment of current and wire feeding, etc., so it is widely used in the direct forming of titanium alloys, nickel-based superalloys, high-strength steel and other metal components. [0003] However, the traditional GTA wire-filling additive manufacturing has a significant disadvantage of low manufacturing efficiency. If a large stacking current is used with a high wire feeding...

Claims

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Application Information

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IPC IPC(8): B23K9/167B23K9/04B23K9/32
CPCB23K9/04B23K9/167B23K9/32
Inventor 熊俊施孟含
Owner SOUTHWEST JIAOTONG UNIV
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