Anti-rotation device, motion table system and lithography device

An anti-rotation and rotational connection technology, applied in the field of lithography, can solve the problems of cable pipeline hazards, loss of positioning ability of the workpiece table, inability to move the workpiece table, etc., to achieve the effect of avoiding resistance

Active Publication Date: 2019-06-07
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Among them, the polarization direction of the stator magnet and the magnetic pole direction generated by the coil of the workpiece table must maintain a certain spatial relationship, otherwise the workpiece table will lose its positioning ability
Based on this spatial relationship, if the workpiece table rotates 45° in the event of software failure or program error, collision, power loss, etc., and the direction of the magnetic field generated by the coil is parallel to the direction of the magnetic field of the magnet in the moving platform, the workpiece table will not be able to movement, and at the same time, this large rotation can cause damage to the cable ducts connected to the workpiece table

Method used

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  • Anti-rotation device, motion table system and lithography device
  • Anti-rotation device, motion table system and lithography device

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Embodiment Construction

[0055]The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0056] The technical solution of the present invention will be described in detail below with specific embodiments. The following specific embodiments may be combined with each other, and the same or similar concepts or processes may not be repeated in some embodiments.

[0057] figure 1 It is a structural representation of a motion platform system of the present invention Figure 1 ; figure 2 It is a structural representation of a motion platform system of...

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Abstract

The invention provides an anti-rotation device, a motion table system and a lithography device. The anti-rotation device is connected between a workpiece table and a cable station and is used for limiting the unexpected angle rotation motion of the workpiece table around a shaft perpendicular to a plane where the workpiece table is located relative to a cable bench, the anti-rotation device comprises a crossing flexible connecting rod module, the two ends of the crossing flexible connecting rod module are respectively rotationally connected with the workpiece table and the cable bench; when the workpiece table is moved in a first direction, the crossing flexible connecting rod module can be compressed or extended in the same direction, the connection positions of the crossing flexible connecting rod module and the working table and the cable bench remain unchanged in a second direction, the first direction is the shortest ligature direction between the workpiece table and the cable bench, and the second direction is perpendicular to the first direction in the same plane. When the crossing flexible connecting rod module is flexible, the connection positions between the crossing flexible connecting rod module and the workpiece table and the cable bench remain unchanged so as to avoid the resistance to the motion of the motion table by motion of the connection points in a non-flexible direction.

Description

technical field [0001] The invention relates to the field of lithography, in particular to an anti-rotation device, a moving table system and lithography equipment. Background technique [0002] In semiconductor lithography equipment, precision workpiece stage motion systems such as silicon wafer stage and mask stage are extremely important key components. [0003] In the existing related technology, a planar magnetic levitation motor can be used to realize a long-stroke coarse movement precision workpiece table motion system, wherein the precision workpiece table motion system includes a motion platform (a stator formed by a plurality of magnets arranged in a certain way) and Consists of a workpiece table containing conductive coils. [0004] Among them, the polarization direction of the stator magnet and the magnetic pole direction generated by the coil of the workpiece table need to maintain a certain spatial relationship, otherwise the workpiece table will lose its posi...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 赵灿武
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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