Ultra-large-scale staring infrared detector splicing substrate and its preparation method
An infrared detector and ultra-large-scale technology, applied in the field of infrared detectors, can solve problems such as the difficulty of preparing infrared detector arrays, achieve the effects of improving fluidity and flatness, and improving splicing accuracy
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0035] Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. While exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited by the embodiments set forth herein. Rather, these embodiments are provided so that the present disclosure will be more thoroughly understood, and will fully convey the scope of the present disclosure to those skilled in the art.
[0036] The embodiment of the present invention provides a super large-scale staring infrared detector splicing substrate, such as figure 1 As shown, it includes: a standard silicon wafer 10, a passivation film layer 12 and a low-resistance metal layer, wherein the low-resistance metal layer specifically includes: a high-precision splicing mark 14 formed by etching the low-resistance metal layer, and a diversion structure 16 ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com