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exposure alignment method

Active Publication Date: 2021-11-23
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] In view of this, the present invention provides an exposure alignment method to solve the problem in the prior art that the takt time is too high and becomes the production bottleneck of the entire photolithography production line

Method used

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Embodiment Construction

[0023] Those skilled in the art will appreciate that for simplicity and clarity, elements shown in the figures have not necessarily been drawn to scale. That is, in various embodiments, selected elements are illustrated to enhance understanding of function and setting of function. In the cases implemented in the market, generally easy-to-understand components that may be useful or necessary are not necessarily described in the schematic diagrams of the following embodiments for convenience. In addition, it should be understood that certain actions and / or steps in an embodiment of a method described or depicted do not necessarily need to appear in a specific order, and for those skilled in the art, such specific sequences do not necessarily require . In addition, it should be understood that the words and terms used in the specification have general meanings. Unless there are other specific meanings recorded in this article, these words and terms are the meanings of investigat...

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Abstract

The invention discloses an exposure alignment method comprising the following steps: measuring and averaging each of a plurality of alignment marks on a first group of substrates to obtain a first measured average value; measuring one of the plurality of sets of alignment marks to obtain a plurality of second measurement values; comparing the first measurement average with the plurality of second measurement values ​​to obtain a predicted compensation value; and The alignment of the alignment marks of the other plurality of sets not measured on the second set of boards is compensated using the estimated compensation value. In this way, the takt time of exposure can be improved, and the productivity of the substrate can be increased.

Description

technical field [0001] The present invention relates to an exposure alignment method, in particular to an exposure alignment method of an array substrate of a liquid crystal panel. Background technique [0002] Nowadays, in the LCD panel industry, the Array Photo Line is usually the bottleneck of the production capacity of the array substrate factory, while the exposure machine is the bottleneck equipment of the photolithography production line. If the takt time is too high, it will become the bottleneck of the entire photolithography production line. Even the production bottleneck of the array substrate factory. Therefore, it is necessary to improve the takt time of the exposure machine to increase the production capacity of the array substrate factory. [0003] Generally speaking, the takt time of the exposure machine includes alignment time and exposure time. By designing and optimizing the alignment mode of the exposure machine (Alignment Mode), the takt time of the equ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/13G03F7/20G03F9/00
CPCG02F1/1303G03F7/70733G03F7/70775G03F7/7085G03F9/7092
Inventor 高通
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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