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Photomask structure

A photomask and pattern technology, applied in optics, originals for opto-mechanical processing, instruments, etc., can solve the problems of a large number of photomasks and high production costs

Pending Publication Date: 2020-08-18
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The embodiment of the present application provides a photomask structure to solve the problem of using a large number of photomasks and high production costs in the production process of integrated circuits or color filter substrates

Method used

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Embodiment Construction

[0061] In order to more clearly illustrate the technical solutions in the embodiments or the prior art, the accompanying drawings that need to be used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the accompanying drawings in the following description are only for invention For some embodiments, those of ordinary skill in the art can also obtain other drawings based on these drawings without any creative effort.

[0062] Specifically, see figure 1 , which is a cross-sectional view of a photomask structure provided by an embodiment of the present application, including: a transparent substrate 101 ; and a photomask pattern disposed on the transparent substrate 101 . Wherein, the photomask pattern at least includes: first nanomaterial patterns 103 distributed in an array, each of the first nanomaterial patterns 103 is electrically connected; a transparent insulating layer, covering at least the first nanomaterial patterns 103...

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Abstract

The invention discloses a photomask structure. The photomask structure comprises a photomask pattern arranged on a transparent substrate, wherein the photomask pattern at least comprises a first nanomaterial pattern, a second nano material pattern and a transparent insulating layer; wherein the first nano-material pattern and the second nano-material pattern are distributed in a staggered manner;and the first nano-material pattern and / or the second nano-material pattern can realize the photomask effect of light transmission and shading by applying voltage. According to the invention, variousphotomask patterns are manufactured on the same photomask structure, the number of photomasks is effectively reduced, the production cost is reduced, the pattern alignment process is simplified in the subsequent patterning process, and the production efficiency is improved.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a photomask structure. Background technique [0002] In recent years, display products have developed rapidly as electronic products that directly participate in people's daily life. Display products are becoming more and more high-end, and the feature sizes defined for integrated circuits or color filter substrates have also begun to change. Therefore, the The size of the mask is also different. In order to meet product requirements and obtain different circuit patterns or color film substrates, the number of photomasks used will increase, and the photomask itself is expensive and has high maintenance costs. Each photolithography must be registered with each other, which increases Reduced production costs and reduced work efficiency. In view of the above problems, it is necessary to provide a photomask structure and a manufacturing method thereof, so as to reduce pr...

Claims

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Application Information

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IPC IPC(8): G03F1/00G03F1/68
CPCG03F1/00G03F1/68
Inventor 莫超德
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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