Substrate alignment method
A substrate and alignment marking technology, which is applied in optics, instruments, and photoplate-making processes on patterned surfaces, etc., can solve problems such as identification failure, interference with CCD identification effects, and impact on automatic production of products, so as to improve accuracy and success rate effect
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[0029] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0030] see figure 1 , the present invention provides a substrate alignment method, comprising the following steps:
[0031] Step S1, please refer to figure 2 , move the image sensor to the top of the first alignment mark 11 located on the mask 10, and preset a reflective interference recognition area 12 on the first alignment mark 11;
[0032] Step S2, please refer to image 3 , moving the substrate 20 so that the second alignment mark 21 located on the substrate 20 is below the first alignment mark 11 on the photomask 10, and the second alignment mark 21 is located outside the reflective interference identification area 12;
[0033] Step S3, the image sensor focuses on the first alignment mark 11 for identification, and obtains the positi...
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