Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Plasma activity enhancement method and plasma generation device

A plasma and generating device technology, applied in the field of plasma, can solve the problems of photon waste and activity decline, and achieve the effect of stable chemical properties and enhanced plasma activity

Active Publication Date: 2019-03-15
HUAZHONG UNIV OF SCI & TECH
View PDF12 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the defects of the prior art, the object of the present invention is to provide a plasma activity enhancement method and a generating device, aiming to solve the problem of photons radiating directly to the surroundings in the existing plasma device, resulting in waste of photons and decreased activity

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Plasma activity enhancement method and plasma generation device
  • Plasma activity enhancement method and plasma generation device
  • Plasma activity enhancement method and plasma generation device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0025] During the formation of plasma, electrons obtain energy from the electric field. High-energy electrons will continuously collide with atoms and molecules, and a series of photochemical reactions will occur between them. When they return from the excited state to the ground state, an emission spectrum will be generated.

[0026] The wavelength of light waves generated by plasma is usually in the range of 180nm-1000nm, including ultraviolet light, visible light and infrared light. Among them, the wavelength of ultraviolet light is 180nm-400nm, which can be divided into long-wave UVA, medium-wa...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a plasma activity enhancement method and a plasma generation device. The invention has a core that a focusing unit which carries out focusing on light wave corresponding to plasma is added or designed on the plasma generation end of the plasma generation device; the focusing unit is set as a concave reflecting mirror; the inner side of the reflecting mirror can be coated with a metal film or a dielectric film; the generated plasma is focused in an area near the focal point of the reflecting mirror under the function of the reflecting mirror, and energy loss caused whenthe plasma is generated and radiated to the periphery is reduced; meanwhile, the plasma which is focused in a focal point area is large; and a mutual collision probability of photons, atoms, moleculesand the like contained in the plasma is large, and physical chemistry reaction among all plasma is accelerated so as to enhance the activity of the plasma.

Description

technical field [0001] The invention belongs to the field of plasma technology, and more specifically relates to a plasma activity enhancement method and a generating device. Background technique [0002] Plasma is the "fourth state" of matter, and it is a quasi-neutral gas composed of charged particles and neutral particles showing collective behavior. According to its system temperature, it can be divided into two categories: high-temperature plasma and low-temperature plasma. [0003] In the plasma discharge process, electrons get energy from the electric field, and high-energy electrons generate active free radicals, electrons, ions and other components through collisions with neutral gases, in which the substances in the plasma are alone or interact with each other, in biomedicine can play an important role. For example, charged particles can inactivate germs and are important substances for sterilizing blood coagulation and descaling material surfaces. Neutral subst...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24
CPCH05H1/24
Inventor 熊紫兰韩睿朱宇
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com