Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Electron beam cladding process parameter optimization method and system based on orthogonal method

A technology of process parameter optimization and electron beam cladding, applied in the direction of chemical process analysis/design, can solve the problems of experiment waste, damage cladding materials, increase test time, etc., achieve reduced data processing, strong adaptability, and avoid experiment cycle effect

Inactive Publication Date: 2019-03-15
GUILIN UNIV OF ELECTRONIC TECH
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the different parameters of the cladding process conditions, the experimental results are greatly affected, and the treatment under some unoptimized parameter conditions may even damage the cladding material, causing damage to the matrix, increasing the test time, and causing waste of the experiment.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Electron beam cladding process parameter optimization method and system based on orthogonal method
  • Electron beam cladding process parameter optimization method and system based on orthogonal method
  • Electron beam cladding process parameter optimization method and system based on orthogonal method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0066] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0067] The purpose of the present invention is to provide an electron beam cladding process parameter optimization method and system based on the orthogonal method, which can reduce the experiment cost and save the experiment time.

[0068] In order to make the above objects, features and advantages of the present invention more comprehensible, the present invention will be further described in detail below in conjunction with the accompanying drawings and spec...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an electron beam cladding process parameter optimization method based on an orthogonal method and an electron beam cladding process parameter optimization system based on the orthogonal method. The electron beam cladding process parameter optimization method comprises the following steps: acquiring process parameter factors required to be optimized; performing univariate experiments on the process parameter factors respectively to obtain factor levels; according to all the factor levels, generating an orthogonal experimental table; sequentially performing a cladding test on each set of scheme in the orthogonal experimental table to obtain target parameter values; according to the target parameter values, acquiring the extremely poor value of each factor; according to the extremely poor value of each factor, determining the optimal level of each factor; according to the optimal level of each factor, acquiring an optimized process parameter combination. Through adoption of the electron beam cladding process parameter optimization method or the electron beam cladding process parameter optimization system, a complicated experimental cycle can be effectively avoided and unnecessary data processing is reduced.

Description

technical field [0001] The invention relates to the field of electron beam cladding, in particular to a method and system for optimizing process parameters of electron beam cladding based on an orthogonal method. Background technique [0002] In order to improve the wear resistance, corrosion resistance, oxidation resistance, etc. of the metal surface, it is necessary to carry out special treatment on the surface of the metal material to meet the required requirements. Electron beam surface cladding is to use electron beam heating to melt the alloy powder preset on the surface of the material. , a method of forming a metallurgically bonded new alloy layer on the surface of a substrate. However, the different parameters of the cladding process conditions have a great influence on the experimental results, and the treatment under some unoptimized parameter conditions may even damage the cladding material, cause damage to the matrix, increase the test time, and cause waste of t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G16C20/10
Inventor 刘海浪王波王小宇黄以平
Owner GUILIN UNIV OF ELECTRONIC TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com